Hot-pressed Silicon Nitride Sputtering Target

Hot-pressed Silicon Nitride Sputtering Targets are a high-purity, high-density ceramic material offered within our extensive range of sputtering targets. With 6 size variations available, they can be customized for use as sputtering targets in thin film deposition systems. Their silicon nitride composition provides properties like high hardness, wear resistance and chemical inertness, making them useful for thin films applications such as protective coatings, semiconductor devices and optical coatings.

1 item

Set Descending Direction