Key Benefits of Thin Film Deposition
Thin film deposition has several advantages that makes it indispensable in materials science research and industrial applications. Our selection of products enables the creation of thin-film devices with diverse applications that offer reliable and reproducible results.
- Electrical conductivity: Tailored for applications like electrical conductors, transistors, and solar cells
- Optical properties: Designed for mirrors, filters, and anti-reflective coatings
- Mechanical properties: Engineered for wear resistance, scratch resistance, or specific hardness
- Functional properties: Deposited materials can exhibit superconductivity, magnetism, biocompatibility, or other desired functionalities
Advanced thin film technology enables the development of advanced devices with unique functionalities, such as:
- Miniaturization: Thin films enable you to create smaller and more compact devices, compared to bulk materials, such as microchips and integrated circuits, TFT's and Microfluidic devices
- Integration: Different materials can be layered on top of each other to create complex structures with combined functionalities like MEMs and solar cells
- Novel functionalities: Thin-film materials can be used to create devices with properties not achievable with traditional bulk material such as metamaterials, superconducting thin films and Shape Memory Alloys
Other advantages include:
- Uniformity and conformality of the film, even on complex and three-dimensional substrates
- Modification of a substrate's surface properties
- A scalable process that can be performed on large areas, making it cost-effective for mass production applications
Thin Film Deposition
At Goodfellow, we understand the exacting needs for applying material films as thin as a few atoms onto the surface of a substrate, to the effect of altering an object’s properties such as its conductivity, durability or optical performance.
Whether this amazingly thin coating can be made from metals, oxides, compounds or other materials, here are some resources on our most popular products:
Thin Film Products
- OFHC Copper Foil Formula: Cu - OFHC
Percentage Purity: 99.99%
Temper: Annealed
Thickness: 12.7mm
Length 1: 150mm
Length 2: 150mm
CAS Number: 7440-50-8
UOM Code: 008-031-02
eachStarting at $124.39
In stockDiscounts applied for volume purchasesFormula: Cu - OFHCPercentage Purity: 99.99%Temper: AnnealedThickness: 12.7mmLength 1: 150mmLength 2: 150mmCAS Number: 7440-50-8UOM Code: 008-031-02 - Aluminum Silicide Powder Formula: Al₄Si₃
Percentage Purity: 98%
Maximum Particle Size: 150µm
Weight: 10000g
CAS Number: 106698-75-3
UOM Code: 621-523-35
eachStarting at $307.16
In stockDiscounts applied for volume purchasesFormula: Al₄Si₃Percentage Purity: 98%Maximum Particle Size: 150µmWeight: 10000gCAS Number: 106698-75-3UOM Code: 621-523-35 - Tungsten Silicide Sputtering Target Formula: WSi₂
Thickness: 3mm
Diameter: 50.8mm
CAS Number: 12039-88-2
UOM Code: 364-581-07
eachStarting at $724.88
In stockDiscounts applied for volume purchasesFormula: WSi₂Thickness: 3mmDiameter: 50.8mmCAS Number: 12039-88-2UOM Code: 364-581-07 - Chromium Silicide Powder (CrSi₂) Formula: CrSi₂
Percentage Purity: 99.999%
Maximum Particle Size: 45µm
Weight: 100g
CAS Number: 12626-44-7
UOM Code: 959-831-94
eachStarting at $214.18
In stockDiscounts applied for volume purchasesFormula: CrSi₂Percentage Purity: 99.999%Maximum Particle Size: 45µmWeight: 100gCAS Number: 12626-44-7UOM Code: 959-831-94 - Lanthanum Oxide Powder Formula: La₂O₃
Maximum Particle Size: 200µm
Weight: 100g
CAS Number: 1312-81-8
UOM Code: 032-329-65
eachStarting at $232.93
In stockDiscounts applied for volume purchasesFormula: La₂O₃Maximum Particle Size: 200µmWeight: 100gCAS Number: 1312-81-8UOM Code: 032-329-65 - Holmium Oxide Powder Formula: Ho2O3
Percentage Purity: 99.999%
Mean Particle Size: 5-10µm
Weight: 50g
Molecular Weight: 377.85
Type: Crystalline solid
Colour: Orange
CAS Number: 12055-62-8
UOM Code: 103-547-93
eachStarting at $266.72
In stockDiscounts applied for volume purchasesFormula: Ho2O3Percentage Purity: 99.999%Mean Particle Size: 5-10µmWeight: 50gMolecular Weight: 377.85Type: Crystalline solidColour: OrangeCAS Number: 12055-62-8UOM Code: 103-547-93
Our diverse selection of materials for thin film deposition
We supply the materials needed in thin film technology, as well as the finished items across a range of industries and sectors:
Metals
Offered in various purities and forms (for example, powders, granules and wires) for applications like:
- Electrical conductors
- Heat sinks
- Reflective coatings
Semiconductors
Materials like silicon and gallium nitride are used for:
- Transistors
- Solar cells
- Other electronic devices
Functional Materials
Materials with specific functionalities like:
- Superconductivity
- Magnetism
- Biocompatibility
Why Goodfellow?
- No minimum order
- Over 175,000 advanced materials
- Supply Chain Management:
- sourcing custom materials for your needs
- Dispatched globally within 48 hours
- Materials customization:
- Custom parts for prototyping | Full product modification | Micro-machining | Microfabrication | Rolling
- Free and fast delivery: Worldwide shipping and customs clearance, to your door. All orders are dispatched within 48 hours
- Commercial arrangements:
- Call off orders | Buffer stock | Fixed and contract pricing | Discounts for increased volumes
- We help you innovate into the future.
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