Nickel/Vanadium Alloy Sputtering Target (Ni93/V7)

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Nickel Vanadium Alloy Sputtering Target (Ni93/V7) offers high corrosion resistance, mechanical strength, and thermal stability, with vanadium contributing to refined microstructures and enhanced oxidation resistance. Designed for thin film deposition, it is used in manufacturing wear-resistant coatings, diffusion barriers, and magnetic films for electronics, optics, and data storage. Industries including aerospace, microelectronics, and renewable energy benefit from its precise film composition control and compatibility with vacuum deposition systems. In research, it supports development of multilayer coatings, tailored magnetic domains, and high-temperature oxidation-resistant surfaces. The sputtering target form ensures uniform material transfer, high purity, and reproducibility, making it essential for both prototyping and production-scale surface engineering applications.

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