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Zinc Oxide/Gallium Oxide (2% GZO) Sputtering Target

Formula: ZnO 98/Ga₂O₃ 2
Form: Sputtering Target
Material: Zinc Oxide/Gallium Oxide (2% GZO)
Commodity: Compounds
Thickness: 5mm
Diameter: 25mm
We now offer Zinc Oxide/Gallium Oxide (2% GZO) Sputtering Targets as part of our extensive range of metal oxide sputtering targets. This 2% gallium doped zinc oxide disk exhibits high electrical conductivity and excellent optical transparency. Sputtered zinc oxide films are used in a variety of applications including transparent conducting oxides, photovoltaic cells, and thin film transistors. With high purity and uniform composition, these 2% GZO disks are ideal for reactive sputtering of ultra-thin transparent conductive oxide layers.
Safety Data Sheet Tolerance Properties
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