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Formula: ZnO 98/Ga₂O₃ 2
Form: Sputtering Target
Material: Zinc Oxide/Gallium Oxide (2% GZO)
Commodity: Compounds
Thickness:
5mm
Diameter:
25mm
We now offer Zinc Oxide/Gallium Oxide (2% GZO) Sputtering Targets as part of our extensive range of metal oxide sputtering targets. This 2% gallium doped zinc oxide disk exhibits high electrical conductivity and excellent optical transparency. Sputtered zinc oxide films are used in a variety of applications including transparent conducting oxides, photovoltaic cells, and thin film transistors. With high purity and uniform composition, these 2% GZO disks are ideal for reactive sputtering of ultra-thin transparent conductive oxide layers.
Other Customers Purchased
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each
Starting at $202.33
Discounts applied for volume purchases -
Zinc Arsenide Powder Formula: Zn₃As₂
Percentage Purity: 99%
Maximum Particle Size: 150µm
Weight: 200g
UOM Code: 032-413-58
eachStarting at $294.94
Discounts applied for volume purchases -
Zinc Oxide Powder Formula: ZnO
Percentage Purity: 99.999%
Maximum Particle Size: 45µm
Weight: 200g
UOM Code: 048-260-33
eachStarting at $197.40
Discounts applied for volume purchases -
Titanium Dioxide Sheet Formula: TiO₂ 99.6%
Thickness: 2mm
Length 1: 25mm
Length 2: 25mm
CAS Number: 13463-67-7
UOM Code: 625-195-31
eachStarting at $573.90
Discounts applied for volume purchases -
Titanium Dioxide Powder Formula: TiO₂ 99.6%
Maximum Particle Size: 45µm
Weight: 500g
CAS Number: 13463-67-7
UOM Code: 197-608-67
eachStarting at $227.11
Discounts applied for volume purchases -
Tungsten Trioxide Powder Formula: WO₃
Maximum Particle Size: 45µm
Weight: 50g
CAS Number: 1314-35-8
UOM Code: 365-623-61
eachStarting at $223.89
Discounts applied for volume purchases
