Nickel/Iron/Molybdenum Alloy Sputtering Target (Ni80/Fe15.5/Mo4.5)

Nickel Iron Molybdenum Alloy Sputtering Target (Ni80/Fe15.5/Mo4.5) offers precise magnetic properties, low film stress, and excellent adhesion in thin-film deposition processes. Molybdenum enhances stability against magnetic aging and enables uniform grain structure, critical for producing consistent thin films used in magnetic memory devices, transformer cores, and advanced sensors. Industries such as microelectronics, aerospace, and renewable energy use this target to deposit anisotropic magnetic layers, create thin-film inductors, and fabricate high-frequency electromagnetic shielding. In research, it is employed in developing multi-layer magnetic stacks, testing domain wall dynamics, and studying high-frequency permeability. The target’s purity, density, and uniform composition ensure reproducible film performance, making it essential in both R&D and commercial-scale magnetic coating applications.