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Formula: ZnO
Form: Sputtering Target
Material: Zinc Oxide
CAS Number: 1314-13-2
Commodity: Compounds
Zinc Oxide Sputtering Targets are thin disk of high purity zinc oxide available in 7 variations. These disks allow deposition of uniform zinc oxide coatings onto substrates via magnetron sputtering. Example applications include transparent conductive oxide layers in photovoltaics, gas sensors and semiconductor devices. The controlled zinc oxide deposition provided by these sputtering targets enables precise tailoring of film properties like conductivity and crystallinity.
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Titanium Dioxide Powder Formula: TiO₂ 99.6%
Maximum Particle Size: 45µm
Weight: 500g
CAS Number: 13463-67-7
UOM Code: 197-608-67
eachStarting at $227.11
Discounts applied for volume purchases -
Tungsten Trioxide Powder Formula: WO₃
Maximum Particle Size: 45µm
Weight: 50g
CAS Number: 1314-35-8
UOM Code: 365-623-61
eachStarting at $223.89
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Zinc Oxide Powder Formula: ZnO
Percentage Purity: 99.999%
Maximum Particle Size: 45µm
Weight: 200g
UOM Code: 048-260-33
eachStarting at $197.40
Discounts applied for volume purchases -
each
Starting at $202.33
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Titanium Dioxide Sheet Formula: TiO₂ 99.6%
Thickness: 2mm
Length 1: 25mm
Length 2: 25mm
CAS Number: 13463-67-7
UOM Code: 625-195-31
eachStarting at $573.90
Discounts applied for volume purchases -
Zinc Arsenide Powder Formula: Zn₃As₂
Percentage Purity: 99%
Maximum Particle Size: 150µm
Weight: 200g
UOM Code: 032-413-58
eachStarting at $294.94
Discounts applied for volume purchases
