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Formula: La
Form: Sputtering Target
Material: Lanthanum
CAS Number: 7439-91-0
Commodity: Metals
Purity: 99%
Thickness: 1mm
Hazard Pictogram: GHS02
Lanthanum Sputtering Targets are a new product within our comprehensive range of sputtering targets. They’re available in a choice of 2 diameters and thicknesses. These high purity Lanthanum disks can be used for thin film deposition thanks to their controlled microstructure and uniform composition. Typical applications include coating optical lenses and manufacturing microelectronics.
Technical Data Sheet Safety Data Sheet Tolerance Properties

Flammable

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Material Properties for Metals

Atomic Properties
Element Value
Atomic number 57
Crystal structure Hexagonal close packed/Face centred cubic
Electronic structure Xe 5d¹ 6s²
Valences shown 3
Atomic weight( amu ) 138.9055
Thermal neutron absorption cross-section( Barns ) 8.9
Photo-electric work function( eV ) 3.5
Natural isotope distribution( Mass No./% ) 139/ 99.91
Natural isotope distribution( Mass No./% ) 138/ 0.09
Atomic radius - Goldschmidt( nm ) 0.187
Ionisation potential( No./eV ) 3/ 19.18
Ionisation potential( No./eV ) 1/ 5.58
Ionisation potential( No./eV ) 2/ 11.06
Mechanical Properties
Element Value
Material condition Polycrystalline
Poisson's ratio 0.28
Bulk modulus( GPa ) 24.8
Tensile modulus( GPa ) 37.9
Hardness - Vickers( kgf mm⁻² ) 40
Tensile strength( MPa ) 131
Yield strength( MPa ) 124
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 57@20@20°C
Superconductivity critical temperature( K ) 4.88
Temperature coefficient( K⁻¹ ) 0.00218@0-100°C
Physical Properties
Element Value
Boiling point( C ) 3457
Density( gcm⁻³ ) 6.174@20°C
Thermal Properties
Element Value
Melting point( C ) 921
Latent heat of evaporation( J g⁻¹ ) 2897
Latent heat of fusion( J g⁻¹ ) 60.2
Specific heat( J K⁻¹ kg⁻¹ ) 197@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 13.4@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 4.9@0-100°C

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