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Formula: Sb
Form: Sputtering Target
Material: Antimony
CAS Number: 7440-36-0
Commodity: Metals
Thickness: 3mm
Hazard Pictogram: GHS06, GHS09
Antimony Sputtering Targets are part of our wide range of sputtering targets used for thin film deposition. These disks come in 2 variations to suit different deposition requirements. They can be used to deposit thin antimony films with properties like high hardness and chemical resistance. Typical applications include surface coatings for items like scientific instruments or medical devices.
Technical Data Sheet Safety Data Sheet Tolerance Properties

Acute toxicity

Hazardous to the environment

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Material Properties for Metals

Atomic Properties
Element Value
Atomic number 51
Crystal structure Rhombohedral
Electronic structure Kr 4d¹⁰ 5s² 5p³
Valences shown -3,0,3,5
Atomic weight( amu ) 121.75
Thermal neutron absorption cross-section( Barns ) 5
Photo-electric work function( eV ) 4.1
Natural isotope distribution( Mass No./% ) 121/ 57.3
Natural isotope distribution( Mass No./% ) 123/ 42.7
Atomic radius - Goldschmidt( nm ) 0.161
Ionisation potential( No./eV ) 1/ 8.64
Ionisation potential( No./eV ) 3/ 25.3
Ionisation potential( No./eV ) 2/ 16.53
Ionisation potential( No./eV ) 5/ 56.0
Ionisation potential( No./eV ) 4/ 44.2
Ionisation potential( No./eV ) 6/ 108
Mechanical Properties
Element Value
Hardness - Mohs 3-3.3
Material condition Polycrystalline
Poisson's ratio 0.25-0.33
Bulk modulus( GPa ) 42
Tensile modulus( GPa ) 54.7
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 40.1@20@20°C
Temperature coefficient( K⁻¹ ) 0.0051@0-100°C
Thermal emf against Pt (cold 0C - hot 100C)( mV ) 4.89
Physical Properties
Element Value
Boiling point( C ) 1750
Density( gcm⁻³ ) 6.68@20
Thermal Properties
Element Value
Melting point( C ) 630.7
Latent heat of evaporation( J g⁻¹ ) 1370
Latent heat of fusion( J g⁻¹ ) 163
Specific heat( J K⁻¹ kg⁻¹ ) 205@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 24.4@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 9@0-100°C

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