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Aluminum/Silicon Alloy Sputtering Target (Al99/Si 1)

Formula: Al 99/Si 1
Form: Sputtering Target
Material: Aluminum/Silicon Alloy
Commodity: Alloys
Purity: 99.998%
Thickness: 6mm
The Aluminum/Silicon Alloy Sputtering Targets (Al99/Si 1) are high-purity alloy disks available in several diameter and thickness variations. They’re commonly used to deposit uniform aluminum-silicon alloy thin films using sputter deposition. With tunable electrical resistivity and other properties, these alloy films are used in microelectronics, photovoltaics and other applications requiring thin functional layers.
Technical Data Sheet Safety Data Sheet Tolerance Properties
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Material Properties for Alloys

Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 2.6-3.5
Temperature coefficient( K⁻¹ ) 0.0042
Thermal Properties
Element Value
Melting point( C ) 600
Physical Properties
Element Value
Density( gcm⁻³ ) 2.7
Mechanical Properties
Element Value
Tensile strength( MPa ) 310

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