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Formula: Mn
Form: Sputtering Target
Material: Manganese
CAS Number: 7439-96-5
Commodity: Metals
Purity: 99.95%
Production Method: Hot Pressed
Manganese Sputtering Targets are circular metallic targets that we manufacture in 7 size variations. Made from high-purity manganese, they enable the uniform deposition of thin films. Key properties like thermal conductivity, hardness and corrosion resistance make manganese films suitable for applications in electronics, magnetic storage media and protective coatings.
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Material Properties for Metals

Atomic Properties
Element Value
Atomic number 25
Crystal structure Body centred cubic
Electronic structure Ar 3d⁵ 4s²
Valences shown 1, 2, 3, 4, 6, 7
Atomic weight( amu ) 54.938
Thermal neutron absorption cross-section( Barns ) 13.3
Photo-electric work function( eV ) 3.8
Atomic radius - Goldschmidt( nm ) 0.112
Ionisation potential( No./eV ) 2/ 15.64
Ionisation potential( No./eV ) 3/ 33.67
Ionisation potential( No./eV ) 4/ 51.2
Ionisation potential( No./eV ) Jun-95
Ionisation potential( No./eV ) 5/ 72.4
Ionisation potential( No./eV ) 1/ 7.43
Mechanical Properties
Element Value
Hardness - Mohs 5
Material condition Polycrystalline
Poisson's ratio 0.24
Bulk modulus( GPa ) 118
Tensile modulus( GPa ) 191
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 160@20@20°C
Physical Properties
Element Value
Boiling point( C ) 1962
Density( gcm⁻³ ) 7.4@20°C
Thermal Properties
Element Value
Melting point( C ) 1244
Latent heat of evaporation( J g⁻¹ ) 4207
Latent heat of fusion( J g⁻¹ ) 267
Specific heat( J K⁻¹ kg⁻¹ ) 477@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 7.81@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 23@0-100°C

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