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Sputtering Target
Goodfellow’s high-purity sputtering targets, with purity up to 99.999% (5N), are engineered for thin film deposition in electronics, optics, and materials research. These targets are characterized by their uniform composition, high density, and excellent deposition performance. They are used in semiconductor manufacturing, optical coatings, and laboratory research. Their reliability and material quality are critical for reproducible results in advanced research and industrial processes.