Titanium Diboride Sputtering Target

Titanium Diboride Sputtering Target delivers high hardness, excellent thermal conductivity, and superior corrosion resistance, making it ideal for creating protective and functional coatings. TiB₂’s high melting point and electrical conductivity enable its use in physical vapor deposition (PVD) systems for depositing wear-resistant, conductive films. Industries such as semiconductor fabrication, aerospace, and tooling employ TiB₂ sputtering targets for producing hard, conductive coatings on cutting tools, engine components, and electronic contacts. Specific uses include deposition of conductive barriers in microelectronics, hard coatings for aerospace bearings, and protective films in high-temperature environments. In research, TiB₂ targets are used to investigate thin-film stress control, adhesion mechanisms, and nanostructured coating performance. Its combination of mechanical resilience and deposition efficiency ensures continued importance in advanced coating technologies.