Cobalt Sputtering Target

Our innovative Cobalt Sputtering Targets are available in 15 variations. Crafted from high-purity cobalt, these discs excel in thin film deposition and coating for semiconductor, optical and magnetic media applications. Their controlled microstructure and tight compositional tolerances make them ideal for sputter coating precision components. Researchers value Cobalt Sputtering Targets for depositing uniform cobalt layers with high adhesion, enhancing applications in spintronics, microelectronics and other advanced technologies.

Formula: Co Form: Sputtering Target Material: Cobalt CAS Number: 7440-48-4 Commodity: Metals Product Code: CO00-ST-000400

Starting at $269.71 each

Discounts applied for volume purchases

Wishlist

View options

My Wish List

Last Added Items

You have no items in your wish list.