Europium Sputtering Target

Europium Sputtering Target is a high-purity, precisely engineered form of europium designed for thin-film deposition through physical vapor deposition (PVD) processes. It retains europium’s distinctive luminescent characteristics while offering excellent sputtering stability, uniform erosion profiles, and high adhesion of deposited films. Key industries making use of this material include optoelectronics, photonics, and advanced coatings manufacturing. Specific applications include the production of europium-doped phosphor films for display and lighting technologies, fabrication of functional oxide films with tailored optical and electronic properties, and integration into multilayer coatings for sensors and optical instruments. In research, europium sputtering targets enable controlled doping and uniform film formation, which are essential for developing next-generation photonic devices, transparent conductors, and specialized catalytic surfaces. Its combination of purity, stability, and process compatibility ensures its high value in precision manufacturing and cutting-edge materials innovation.

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Properties

Reference & Citations

Flammable

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	63
Crystal structure	Body centred cubic
Electronic structure	Xe 4f⁷ 6s²
Valences shown	2, 3
Atomic weight( amu )	151.96
Thermal neutron absorption cross-section( Barns )	4100
Photo-electric work function( eV )	2.5
Natural isotope distribution( Mass No./% )	153/ 52.2
Natural isotope distribution( Mass No./% )	151/ 47.8
Atomic radius - Goldschmidt( nm )	0.204
Ionisation potential( No./eV )	1/ 5.67
Ionisation potential( No./eV )	2/ 11.25

Mechanical Properties

Element	Value
Material condition	Polycrystalline
Poisson's ratio	0.286
Bulk modulus( GPa )	12.1
Tensile modulus( GPa )	14.7
Hardness - Vickers( kgf mm⁻² )	20

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	90.0@25@25°C
Temperature coefficient( K⁻¹ )	0.0048@0-100°C

Physical Properties

Element	Value
Boiling point( C )	1597
Density( gcm⁻³ )	5.243@25°C

Thermal Properties

Element	Value
Melting point( C )	822
Latent heat of evaporation( J g⁻¹ )	1155
Latent heat of fusion( J g⁻¹ )	63.4
Specific heat( J K⁻¹ kg⁻¹ )	176@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	13.9@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	32@0-100°C