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Erbium Sputtering Target

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Composition: Er Form: Sputtering Target Material: Erbium CAS Number: 7440-52-0 Commodity: Metals Purity: 99% Thickness: 1mm
Erbium Sputtering Target is a high-purity metallic form of erbium engineered for thin-film deposition via magnetron or ion-beam sputtering. Known for its sharp 1.54 μm optical emission, corrosion resistance, and magnetic characteristics, erbium enables the production of optically active coatings for photonics, telecommunications, and quantum devices. The sputtering target format ensures uniform erosion, low particle generation, and high deposition rates, critical for fabricating erbium-doped optical amplifiers, laser gain media, and photonic integrated circuits. Manufacturing advancements, such as grain size optimization and high-vacuum purification, enhance target density and film uniformity. Applications extend to waveguide fabrication, infrared optical filters, and specialized coatings for high-power laser systems. In research and industry, Erbium Sputtering Targets are essential for producing defect-free, compositionally precise thin films that advance optical communication, sensing, and integrated photonics technologies.

Flammable

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Material Properties

Atomic Properties
Element Value
Atomic number 68
Crystal structure Hexagonal close packed
Electronic structure Xe 4f¹² 6s²
Valences shown 3
Atomic weight( amu ) 167.26
Thermal neutron absorption cross-section( Barns ) 160
Natural isotope distribution( Mass No./% ) 166/ 33.4
Natural isotope distribution( Mass No./% ) 162/ 0.1
Natural isotope distribution( Mass No./% ) 168/ 27.0
Natural isotope distribution( Mass No./% ) 170/ 15.0
Natural isotope distribution( Mass No./% ) 167/ 22.9
Natural isotope distribution( Mass No./% ) 164/ 1.6
Atomic radius - Goldschmidt( nm ) 0.175
Ionisation potential( No./eV ) 2/ 11.93
Ionisation potential( No./eV ) 1/ 6.10
Mechanical Properties
Element Value
Material condition Polycrystalline
Poisson's ratio 0.207
Bulk modulus( GPa ) 41.8
Tensile modulus( GPa ) 73.3
Hardness - Vickers( kgf mm⁻² ) 70
Tensile strength( MPa ) 292
Yield strength( MPa ) 292
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 86@20°C
Temperature coefficient( K⁻¹ ) 0.00201@0-100°C
Physical Properties
Element Value
Boiling point( C ) 2863
Density( gcm⁻³ ) 9.051@20°C
Thermal Properties
Element Value
Melting point( C ) 1529
Latent heat of evaporation( J g⁻¹ ) 1680
Latent heat of fusion( J g⁻¹ ) 103
Specific heat( J K⁻¹ kg⁻¹ ) 168@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 14.5@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 9.2@0-100°C
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Available Configurations

Properties common to all products in this list

Composition: Er Form: Sputtering Target Material: Erbium CAS Number: 7440-52-0 Commodity: Metals Purity: 99% Thickness: 1mm

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Tolerances

Disk
Thickness <0.01mm ±25%
Thickness =<0.05mm ±15%
Thickness >0.05mm ±10%
Diameter ±0.5mm