Erbium Sputtering Target

Erbium Sputtering Target is a high-purity metallic form of erbium engineered for thin-film deposition via magnetron or ion-beam sputtering. Known for its sharp 1.54 μm optical emission, corrosion resistance, and magnetic characteristics, erbium enables the production of optically active coatings for photonics, telecommunications, and quantum devices. The sputtering target format ensures uniform erosion, low particle generation, and high deposition rates, critical for fabricating erbium-doped optical amplifiers, laser gain media, and photonic integrated circuits. Manufacturing advancements, such as grain size optimization and high-vacuum purification, enhance target density and film uniformity. Applications extend to waveguide fabrication, infrared optical filters, and specialized coatings for high-power laser systems. In research and industry, Erbium Sputtering Targets are essential for producing defect-free, compositionally precise thin films that advance optical communication, sensing, and integrated photonics technologies.

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Properties

Reference & Citations

Flammable

each

Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	68
Crystal structure	Hexagonal close packed
Electronic structure	Xe 4f¹² 6s²
Valences shown	3
Atomic weight( amu )	167.26
Thermal neutron absorption cross-section( Barns )	160
Natural isotope distribution( Mass No./% )	166/ 33.4
Natural isotope distribution( Mass No./% )	162/ 0.1
Natural isotope distribution( Mass No./% )	168/ 27.0
Natural isotope distribution( Mass No./% )	170/ 15.0
Natural isotope distribution( Mass No./% )	167/ 22.9
Natural isotope distribution( Mass No./% )	164/ 1.6
Atomic radius - Goldschmidt( nm )	0.175
Ionisation potential( No./eV )	2/ 11.93
Ionisation potential( No./eV )	1/ 6.10

Mechanical Properties

Element	Value
Material condition	Polycrystalline
Poisson's ratio	0.207
Bulk modulus( GPa )	41.8
Tensile modulus( GPa )	73.3
Hardness - Vickers( kgf mm⁻² )	70
Tensile strength( MPa )	292
Yield strength( MPa )	292

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	86@20@20°C
Temperature coefficient( K⁻¹ )	0.00201@0-100°C

Physical Properties

Element	Value
Boiling point( C )	2863
Density( gcm⁻³ )	9.051@20°C

Thermal Properties

Element	Value
Melting point( C )	1529
Latent heat of evaporation( J g⁻¹ )	1680
Latent heat of fusion( J g⁻¹ )	103
Specific heat( J K⁻¹ kg⁻¹ )	168@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	14.5@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	9.2@0-100°C