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Cobalt Sputtering Target

Available Configurations

Properties common to all products in this list

Composition: Co Form: Sputtering Target Material: Cobalt CAS Number: 7440-48-4 Commodity: Metals
Cobalt Sputtering Target is a high-purity, engineered form of cobalt specifically designed for thin-film deposition in physical vapor deposition (PVD) and magnetron sputtering processes. With purity levels between 99.9% and 99.99%, it delivers excellent coating adhesion, uniformity, and microstructural control, enabling high-performance functional and decorative films. Its mechanical stability, corrosion resistance, and magnetic properties make it indispensable in electronics, optics, data storage, and aerospace applications. Technologies that rely on cobalt sputtering targets include magnetic storage media fabrication, protective barrier coatings for semiconductor devices, and optical interference layers for advanced optical systems. Innovations in production—such as purity enhancement, microstructure refinement, and controlled magnetic permeability—allow for improved sputtering efficiency and reduced particle generation, directly enhancing yield and reliability in high-tech manufacturing. The material’s precise engineering ensures its continued role in pushing the boundaries of thin-film technology for both industrial and research applications.

Health hazard/Hazardous to the ozone layer

Serious health hazard

Starting at $340.00 each
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Material Properties

Atomic Properties
Element Value
Atomic number 27
Crystal structure Hexagonal close packed
Electronic structure Ar 3d⁷ 4s²
Valences shown 2, 3
Atomic weight( amu ) 58.9332
Thermal neutron absorption cross-section( Barns ) 37.5
Photo-electric work function( eV ) 5
Atomic radius - Goldschmidt( nm ) 0.125
Ionisation potential( No./eV ) 2/ 17.06
Ionisation potential( No./eV ) 4/ 51.3
Ionisation potential( No./eV ) 3/ 33.5
Ionisation potential( No./eV ) 1/ 79.5
Ionisation potential( No./eV ) 1/ 79.5
Ionisation potential( No./eV ) 6/ 102
Mechanical Properties
Element Value
Material condition Hard
Material condition Soft
Poisson's ratio 0.32
Poisson's ratio 0.32
Bulk modulus( GPa ) 181.5
Bulk modulus( GPa ) 181.5
Tensile modulus( GPa ) 211
Tensile modulus( GPa ) 211
Hardness - Vickers( kgf mm⁻² ) 320
Hardness - Vickers( kgf mm⁻² ) 170
Tensile strength( MPa ) 1135
Tensile strength( MPa ) 760
Yield strength( MPa ) 345-485
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 6.34@20°C
Temperature coefficient( K⁻¹ ) 0.0066@0-100°C
Thermal emf against Pt (cold 0C - hot 100C)( mV ) -1.33
Physical Properties
Element Value
Boiling point( C ) 2870
Density( gcm⁻³ ) 8.9@20°C
Thermal Properties
Element Value
Melting point( C ) 1495
Latent heat of evaporation( J g⁻¹ ) 6490
Latent heat of fusion( J g⁻¹ ) 263
Specific heat( J K⁻¹ kg⁻¹ ) 456@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 100@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 12.5@0-100°C
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Available Configurations

Properties common to all products in this list

Composition: Co Form: Sputtering Target Material: Cobalt CAS Number: 7440-48-4 Commodity: Metals

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Tolerances

Sputtering Target
Thickness <0.01mm ±25%
Thickness =<0.05mm ±15%
Thickness >0.05mm ±10%
Diameter ±0.5mm