Bismuth Sputtering Target

Formula: Bi

Form: Sputtering Target

Material: Bismuth

CAS Number: 7440-69-9

Commodity: Metals

Purity: 99.97%

Bismuth Sputtering Targets are designed for thin film deposition and coating applications utilizing sputter deposition techniques. They come in a choice of 4 variations, with diameters ranging from 50mm to 75mm. Bismuth is a brittle metal that has interesting electrical properties, including high electrical resistance and diamagnetism. With their unique properties these disks are useful for specialized electronics and optical coatings.

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	83
Crystal structure	Rhombohedral
Electronic structure	Xe 4f¹⁴ 5d¹⁰ 6s² 6p³
Valences shown	3, 5
Atomic weight( amu )	208.9804
Thermal neutron absorption cross-section( Barns )	0.034
Photo-electric work function( eV )	4.4
Atomic radius - Goldschmidt( nm )	0.182
Ionisation potential( No./eV )	5/ 56.0
Ionisation potential( No./eV )	1/ 7.29
Ionisation potential( No./eV )	3/ 25.6
Ionisation potential( No./eV )	4/ 45.3
Ionisation potential( No./eV )	6/ 88.3
Ionisation potential( No./eV )	2/ 16.7

Mechanical Properties

Element	Value
Material condition	Polycrystalline
Poisson's ratio	0.33
Bulk modulus( GPa )	31.3
Tensile modulus( GPa )	34
Hardness - Vickers( kgf mm⁻² )	16-19

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	117@20@20°C
Temperature coefficient( K⁻¹ )	0.0046@0-100°C
Thermal emf against Pt (cold 0C - hot 100C)( mV )	-7.34

Physical Properties

Element	Value
Boiling point( C )	1560
Density( gcm⁻³ )	9.8@20°C

Thermal Properties

Element	Value
Melting point( C )	271.3
Latent heat of evaporation( J g⁻¹ )	857
Latent heat of fusion( J g⁻¹ )	52
Specific heat( J K⁻¹ kg⁻¹ )	124@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	7.9@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	13.4@0-100°C

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Bismuth Sputtering Target

Material Properties for Metals