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Formula: BiFeO₃
Form: Sputtering Target
Material: Bismuth Ferrite
Commodity: Compounds
Thickness:
3.175mm
Diameter:
25.4mm
Type:
Perovskite
Hazard Pictogram:
GHS07
Bismuth Ferrite Sputtering Targets are a high-quality thin film deposition material used in the electronics and optics industries. These disc-shaped ceramic targets feature a perovskite crystal structure and high piezoelectricity. Key applications include thin film deposition via magnetron sputtering to produce ferroelectric, piezoelectric and multiferroic thin films, for use in data storage, sensors, transducers and electro-optic devices. With precise composition control and a fine-grained microstructure, our Bismuth Ferrite Sputtering Targets enable reliable and repeatable thin film fabrication.
Health hazard/Hazardous to the ozone layer
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Nickel/Iron/Molybdenum Alloy Sputtering Target (Ni80/Fe15.5/Mo 4.5) Formula: Ni80/Fe15.5/Mo 4.5
Thickness: 3mm
Diameter: 50.8mm
UOM Code: 934-571-32
eachStarting at $361.99
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Nickel/Vanadium Alloy Sputtering Target (Ni93/V 7) Formula: Ni93/V 7
Thickness: 3mm
Diameter: 76.2mm
UOM Code: 300-832-51
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Zinc Oxide/Aluminum Oxide Sputtering Target (ZnO 99/Al₂O₃ 1) Formula: ZnO 99/Al₂O₃ 1
Thickness: 3mm
Diameter: 25.4mm
UOM Code: 872-065-75
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Perovskite Barium Titanate Powder Grade: Perovskite
Formula: BaTiO₃
Particle Size D10: 2.17µmµm
Particle Size D50: 5.19µmµm
Particle Size D90: 20.54µmµm
Weight: 1000g
Minimum Purity: 99.95%
CAS Number: 12047-27-7
UOM Code: 685-179-84
eachStarting at $169.09
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Zinc Oxide/Aluminum Oxide Sputtering Target (ZnO 98/Al₂O₃ 2) Formula: ZnO 98/Al₂O₃ 2
Thickness: 3mm
Diameter: 25.4mm
UOM Code: 046-253-77
eachStarting at $609.23
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Zinc Oxide/Gallium Oxide (2% GZO) Sputtering Target Formula: ZnO 98 / Ga2O3 2
Thickness: 5mm
Diameter: 25mm
UOM Code: 315-266-36
eachStarting at $724.88
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