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Bismuth Ferrite Sputtering Target

Formula: BiFeO₃
Form: Sputtering Target
Material: Bismuth Ferrite
Commodity: Compounds
Thickness: 3.175mm
Diameter: 25.4mm
Type: Perovskite
Hazard Pictogram: GHS07
Bismuth Ferrite Sputtering Targets are a high-quality thin film deposition material used in the electronics and optics industries. These disc-shaped ceramic targets feature a perovskite crystal structure and high piezoelectricity. Key applications include thin film deposition via magnetron sputtering to produce ferroelectric, piezoelectric and multiferroic thin films, for use in data storage, sensors, transducers and electro-optic devices. With precise composition control and a fine-grained microstructure, our Bismuth Ferrite Sputtering Targets enable reliable and repeatable thin film fabrication.
Safety Data Sheet Tolerance Properties

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