Bismuth Ferrite Sputtering Target
Bismuth Ferrite Sputtering Targets are a high-quality thin film deposition material used in the electronics and optics industries. These disc-shaped ceramic targets feature a perovskite crystal structure and high piezoelectricity. Key applications include thin film deposition via magnetron sputtering to produce ferroelectric, piezoelectric and multiferroic thin films, for use in data storage, sensors, transducers and electro-optic devices. With precise composition control and a fine-grained microstructure, our Bismuth Ferrite Sputtering Targets enable reliable and repeatable thin film fabrication.
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Bismuth Ferrite Sputtering Target Technical Name: Bismuth Ferrite
Formula: BiFeO₃
Density: 6.8g/cm³
Type: Perovskite
Thickness: 3.175mm
Diameter: 25.4mm
UOM Code: 102-268-09POAeachDiscounts applied for volume purchases
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