Aluminium Nitride Sputtering Target
Aluminium Nitride Sputtering Targets are part our wide range of ceramic sputtering target materials. Available in 2 variations, these high purity aluminum nitride discs feature exceptional thermal conductivity, electrical resistivity and hardness. With applications in microelectronics, optoelectronics, and photovoltaics, they enable precise thin film deposition for advanced semiconductor devices, LEDs, laser diodes and solar cells. The uniform composition and dense structure of these sputtering targets make them ideal for producing smooth, defect-free nitride films using magnetron sputtering or ion beam deposition.
-
Aluminium Nitride Sputtering Target Thickness: 3mm
Technical Name: Aluminium Nitride
Formula: AlN
Density: 3.26g/cm³
CAS Number: 24304-00-5
Diameter: 50mm
UOM Code: 886-556-42€677.10 Price from €501.05eachDiscounts applied for volume purchases -
-
Aluminium Nitride Sputtering Target Thickness: 6mm
Technical Name: Aluminium Nitride
Formula: AlN
Density: 3.26g/cm³
CAS Number: 24304-00-5
Diameter: 50mm
UOM Code: 326-830-91€798.67 Price from €591.01eachDiscounts applied for volume purchases
Filter By
Filter By
My Wish List
Last Added Items
You have no items in your wish list.
