Boron Nitride Sputtering Target

Boron Nitride Sputtering Targets are used for thin film deposition techniques like magnetron sputtering. These high purity disks are available in 3 size variations. The hexagonal crystal structure of boron nitride gives them excellent thermal conductivity, electrical insulation and lubricity. Common applications include semiconductor device fabrication, hard protective coatings and thermally conductive fillers.

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1000035338

25.4mm

1000035342

50.8mm

1000035346

76.2mm

$289.14each
5+ for $234.20ea
10+ for $213.96ea

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$361.99each
5+ for $293.21ea
10+ for $267.87ea

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$483.18each
5+ for $391.38ea
10+ for $357.55ea

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Material Properties for Ceramics

Chemical Resistance

Element	Value
Acids - concentrated	Fair
Acids - dilute	Fair
Alkalis	Fair
Halogens	Poor
Metals	Good

Electrical Properties

Element	Value
Dielectric constant	4.3
Dielectric strength( kV mm⁻¹ )	40-200
Volume resistivity( Ohmcm )	10¹¹-10¹⁴@25

Physical Properties

Element	Value
Apparent porosity( % )	Feb-15
Density( gcm⁻³ )	1.9-2.2

Thermal Properties

Element	Value
Sublimation point( C )	2600-2800
Upper continuous use temperature( C )	950-2500
Specific heat( J K⁻¹ kg⁻¹ )	800-2000@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	15-50@20°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	1-36@20-1000°C