Vanadium Sputtering Target

Formula: V

Form: Sputtering Target

Material: Vanadium

CAS Number: 7440-62-2

Commodity: Metals

Purity: 99.8%

Our Vanadium Sputtering Targets are made from high-purity vanadium, with 7 variations available. These disks enable precise control over vanadium film properties such as superior electrical conductivity and corrosion resistance. This makes these disks ideal for electrical contacts, superconducting magnets, and other advanced applications requiring precise vanadium film deposition.

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	23
Crystal structure	Body centred cubic
Electronic structure	Ar 3d³ 4s²
Valences shown	2,3,4,5
Atomic weight( amu )	50.9415
Thermal neutron absorption cross-section( Barns )	5.06
Photo-electric work function( eV )	4.3
Natural isotope distribution( Mass No./% )	51/ 99.75
Natural isotope distribution( Mass No./% )	50/ 0.25
Atomic radius - Goldschmidt( nm )	0.136
Ionisation potential( No./eV )	3/ 29.3
Ionisation potential( No./eV )	2/ 14.6
Ionisation potential( No./eV )	5/ 65.2
Ionisation potential( No./eV )	6/ 128
Ionisation potential( No./eV )	1/ 6.74
Ionisation potential( No./eV )	4/ 46.7

Mechanical Properties

Element	Value
Material condition	Hard
Material condition	Soft
Poisson's ratio	0.365
Poisson's ratio	0.365
Bulk modulus( GPa )	158
Bulk modulus( GPa )	158
Tensile modulus( GPa )	127.6
Tensile modulus( GPa )	127.6
Izod toughness( J m⁻¹ )	10-136
Hardness - Vickers( kgf mm⁻² )	80
Hardness - Vickers( kgf mm⁻² )	150
Tensile strength( MPa )	260-585
Tensile strength( MPa )	530-730
Yield strength( MPa )	170-450
Yield strength( MPa )	515-690

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	19.6@20@20°C
Superconductivity critical temperature( K )	5.4
Temperature coefficient( K⁻¹ )	0.0039@0-100°C
Thermal emf against Pt (cold 0C - hot 100C)( mV )	0.63

Physical Properties

Element	Value
Boiling point( C )	3380
Density( gcm⁻³ )	6.1@20°C

Thermal Properties

Element	Value
Melting point( C )	1890
Latent heat of evaporation( J g⁻¹ )	8975
Latent heat of fusion( J g⁻¹ )	345
Specific heat( J K⁻¹ kg⁻¹ )	486@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	30.7@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	8.3@0-100°C

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Vanadium Sputtering Target

Material Properties for Metals