Tungsten Trioxide Sputtering Target

Formula: WO₃

Form: Sputtering Target

Material: Tungsten Trioxide

CAS Number: 1314-35-8

Commodity: Compounds

Hazard Pictogram: GHS07

Yttrium Sputtering Target disks are high purity yttrium metal disks available in 3 variations. They can be used as sputtering targets in thin film deposition systems. The reactive sputtering of yttrium is a key process in the production of high temperature superconducting films, optical coatings and yttrium-based ceramics. Yttrium's chemical inertness also makes these disks useful in the formation of corrosion resistant coatings for industrial applications.

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