Samarium Sputtering Target

Formula: Sm

Form: Sputtering Target

Material: Samarium

CAS Number: 7440-19-9

Commodity: Metals

Purity: 95%

Thickness: 1mm

Hazard Pictogram: GHS02

Our range of Samarium Sputtering Targets offer high purity samarium in a choice of 2 sizes and thicknesses to meet various application needs. Thanks to their high quality, they enable uniform deposition of Samarium thin films that can be used in optical coatings, semiconductor devices and magnetic recording media. With precise control over the film’s thickness and properties, these sputtering targets allow researchers to develop advanced materials and components.

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	62
Crystal structure	Rhombohedral
Electronic structure	Xe 4f⁶ 6s²
Valences shown	2,3
Atomic weight( amu )	150.36
Thermal neutron absorption cross-section( Barns )	5820
Photo-electric work function( eV )	2.7
Natural isotope distribution( Mass No./% )	149/ 13.9
Natural isotope distribution( Mass No./% )	144/ 3.1
Natural isotope distribution( Mass No./% )	148/ 11.3
Natural isotope distribution( Mass No./% )	152/ 26.6
Natural isotope distribution( Mass No./% )	147/ 15.1
Natural isotope distribution( Mass No./% )	150/ 7.4
Natural isotope distribution( Mass No./% )	154/ 22.6
Atomic radius - Goldschmidt( nm )	0.18
Ionisation potential( No./eV )	1/ 5.63
Ionisation potential( No./eV )	2/ 11.07

Mechanical Properties

Element	Value
Material condition	Polycrystalline
Poisson's ratio	0.31
Bulk modulus( GPa )	29.9
Tensile modulus( GPa )	34.1
Tensile strength( MPa )	124
Yield strength( MPa )	110

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	92@20@20°C
Temperature coefficient( K⁻¹ )	0.00148@0-100°C

Physical Properties

Element	Value
Boiling point( C )	1791
Density( gcm⁻³ )	7.536@20°C

Thermal Properties

Element	Value
Melting point( C )	1077
Latent heat of evaporation( J g⁻¹ )	1280
Latent heat of fusion( J g⁻¹ )	72.4
Specific heat( J K⁻¹ kg⁻¹ )	180@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	13.3@0-100°C

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Samarium Sputtering Target

Material Properties for Metals