Praseodymium Sputtering Target

Formula: Pr

Form: Sputtering Target

Material: Praseodymium

CAS Number: 7440-10-0

Commodity: Metals

Purity: 99%

Hazard Pictogram: GHS02

Praseodymium Sputtering Targets comes in 4 variations. They’re used to deposit uniform thin film coatings onto substrates via the sputtering process. They’re used in optical coating applications and in the manufacture of electrical components. The high purity praseodymium deposition layer these disks provide enables precise control over the optical, electrical and magnetic properties of the sputtered film.

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	59
Crystal structure	Hexagonal close packed
Electronic structure	Xe 4f³ 6s²
Valences shown	3,4
Atomic weight( amu )	140.9077
Thermal neutron absorption cross-section( Barns )	11.5
Atomic radius - Goldschmidt( nm )	0.183
Ionisation potential( No./eV )	1/ 5.42
Ionisation potential( No./eV )	2/ 10.55
Ionisation potential( No./eV )	4/ 38.95
Ionisation potential( No./eV )	5/ 57.45
Ionisation potential( No./eV )	3/ 21.62

Mechanical Properties

Element	Value
Material condition	Polycrystalline
Poisson's ratio	0.312
Bulk modulus( GPa )	31.2
Tensile modulus( GPa )	35.2
Hardness - Vickers( kgf mm⁻² )	40
Tensile strength( MPa )	110
Yield strength( MPa )	103

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	68@20@20°C
Temperature coefficient( K⁻¹ )	0.00171@0-100°C

Physical Properties

Element	Value
Boiling point( C )	3512
Density( gcm⁻³ )	6.782@20°C

Thermal Properties

Element	Value
Melting point( C )	931
Latent heat of evaporation( J g⁻¹ )	2343
Latent heat of fusion( J g⁻¹ )	80
Specific heat( J K⁻¹ kg⁻¹ )	192@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	12.5@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	4.8@0-100

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Praseodymium Sputtering Target

Material Properties for Metals