Hafnium Sputtering Target

Formula: Hf

Form: Sputtering Target

Material: Hafnium

CAS Number: 7440-58-6

Commodity: Metals

Purity: 97%

Hafnium Sputtering Targets are available in 6 variations. Hafnium is a lustrous transition metal with excellent corrosion resistance. Our high-purity hafnium disks are commonly used as sputtering targets for thin film deposition, taking advantage of their high melting point and chemical inertness. Potential applications include optical coatings, wear-resistant coatings and microelectronics, where hafnium oxide is used as a high-k dielectric gate insulator.

Wishlist

Technical Data Sheet Safety Data Sheet Tolerance Properties

each

Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	72
Crystal structure	Hexagonal close packed
Electronic structure	Xe 4f¹⁴ 5d² 6s²
Valences shown	4
Atomic weight( amu )	178.49
Thermal neutron absorption cross-section( Barns )	103
Photo-electric work function( eV )	3.9
Natural isotope distribution( Mass No./% )	179/ 13.8
Natural isotope distribution( Mass No./% )	176/ 5.2
Natural isotope distribution( Mass No./% )	180/ 35.2
Natural isotope distribution( Mass No./% )	174/ 0.2
Natural isotope distribution( Mass No./% )	177/ 18.5
Natural isotope distribution( Mass No./% )	178/ 27.1
Atomic radius - Goldschmidt( nm )	0.159
Ionisation potential( No./eV )	3/ 23.3
Ionisation potential( No./eV )	1/ 7.0
Ionisation potential( No./eV )	2/ 14.9
Ionisation potential( No./eV )	4/ 33.3

Mechanical Properties

Element	Value
Material condition	Hard
Material condition	Soft
Poisson's ratio	0.26
Poisson's ratio	0.26
Bulk modulus( GPa )	109
Bulk modulus( GPa )	109
Tensile modulus( GPa )	141
Tensile modulus( GPa )	141
Hardness - Vickers( kgf mm⁻² )	150-180
Tensile strength( MPa )	445
Tensile strength( MPa )	745
Yield strength( MPa )	365
Yield strength( MPa )	240

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	32.2@20@20°C
Superconductivity critical temperature( K )	0.128
Temperature coefficient( K⁻¹ )	0.0044@0-100°C

Physical Properties

Element	Value
Boiling point( C )	4602
Density( gcm⁻³ )	13.1@20°C

Thermal Properties

Element	Value
Melting point( C )	2227
Latent heat of evaporation( J g⁻¹ )	3700
Latent heat of fusion( J g⁻¹ )	122
Specific heat( J K⁻¹ kg⁻¹ )	146@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	23@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	6@0-100°C

Services

Applications

170k+ products

No minimum order

Free delivery worldwide*

Hafnium Sputtering Target

Material Properties for Metals