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Formula: C
Form: Sputtering Target
Material: Carbon
CAS Number: 7440-44-0
Commodity: Metals
Purity: 99.997%
Our range of Carbon Sputtering Targets are high-purity carbon targets used for thin film deposition. With 16 size variations, they provide customizable sputtering options. Their dense graphitic carbon structure ensures uniform, directional deposition critical for coating precision optics or electronics. Carbon films deposited using these target disks enable cutting-edge applications like hard protective coatings, optical filters and integrated circuit components.
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Material Properties for Metals

Atomic Properties
Element Value
Atomic number 6
Crystal structure Hexagonal/Diamond
Electronic structure He 2s² 2p²
Valences shown 2, 3, 4
Atomic weight( amu ) 12.011
Thermal neutron absorption cross-section( Barns ) 0.0034
Photo-electric work function( eV ) 4.8
Natural isotope distribution( Mass No./% ) 12/ 98.89
Natural isotope distribution( Mass No./% ) 13/ 1.11
Atomic radius - Goldschmidt( nm ) 0.077
Ionisation potential( No./eV ) 6/ 490
Ionisation potential( No./eV ) 4/ 64.5
Ionisation potential( No./eV ) 1/ 11.26
Ionisation potential( No./eV ) 3/ 47.9
Ionisation potential( No./eV ) 2/ 24.38
Ionisation potential( No./eV ) 5/ 392
Mechanical Properties
Element Value
Hardness - Mohs 0.5-1
Hardness - Mohs 10
Material condition Diamond
Material condition Graphite
Bulk modulus( GPa ) 33
Bulk modulus( GPa ) 542
Tensile modulus( GPa ) 4.8
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 1375@0@0°C
Thermal emf against Pt (cold 0C - hot 100C)( mV ) 0.7
Physical Properties
Element Value
Boiling point( C ) 5000
Density( gcm⁻³ ) 2.25@20°C
Thermal Properties
Element Value
Melting point( C ) 3650
Specific heat( J K⁻¹ kg⁻¹ ) 712@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 80-240@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 0.6-4.3@0-100°C

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