Cerium Sputtering Target
Cerium Sputtering Targets are high-purity metal discs offered as part of our extensive range of materials for research and development. With high thermal and electrical conductivity, these discs are available in 99.9% purity and sizes up to 3” diameter, with a variety of thickness options. Their controlled composition and dimensional precision make them ideal for use as sputtering targets in thin film deposition systems for electronics, optics and semiconductor device fabrication. Offering a combination of properties, our Cerium Sputtering Targets provide researchers flexibility in exploring cerium-based coatings and films.
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Cerium Sputtering Target Thickness: 1mm
Diameter: 50mm
Technical Name: Cerium
Formula: Ce
Percentage Purity: 99.9%
Density: 6.77g/cm³
CAS Number: 7440-45-1
UOM Code: 301-551-05POAeachDiscounts applied for volume purchases -
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Cerium Sputtering Target Thickness: 1mm
Diameter: 75mm
Technical Name: Cerium
Formula: Ce
Percentage Purity: 99.9%
Density: 6.77g/cm³
CAS Number: 7440-45-1
UOM Code: 693-883-41POAeachDiscounts applied for volume purchases -
Cerium Sputtering Target Thickness: 3mm
Diameter: 50mm
Technical Name: Cerium
Formula: Ce
Percentage Purity: 99.9%
Density: 6.77g/cm³
CAS Number: 7440-45-1
UOM Code: 240-606-64POAeachDiscounts applied for volume purchases -
Cerium Sputtering Target Thickness: 3mm
Diameter: 75mm
Technical Name: Cerium
Formula: Ce
Percentage Purity: 99.9%
Density: 6.77g/cm³
CAS Number: 7440-45-1
UOM Code: 075-829-67POAeachDiscounts applied for volume purchases
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