Rhodium Sputtering Target
Rhodium Sputtering Targets are available in 3 size variations to allow customization for different deposition processes. Made from high purity rhodium, they provide excellent corrosion resistance, reflectivity and durability. Sputtering targets like these are ideal for applications in electronics, optics and semiconductor manufacturing where a controlled thin film deposition is critical. With customizable dimensions and purity, our Rhodium Sputtering Targets meet a wide range of research and industrial needs.
-
Rhodium Sputtering Target Thickness: 1mm
Diameter: 25mm
Technical Name: Rhodium
Formula: Rh
Percentage Purity: 99.9%
Density: 12.4g/cm³
CAS Number: 7440-16-6
UOM Code: 475-433-51POAeachDiscounts applied for volume purchases -
-
Rhodium Sputtering Target Thickness: 3mm
Diameter: 10mm
Technical Name: Rhodium
Formula: Rh
Percentage Purity: 99.9%
Density: 12.4g/cm³
CAS Number: 7440-16-6
UOM Code: 554-782-78POAeachDiscounts applied for volume purchases -
Rhodium Sputtering Target Thickness: 1mm
Diameter: 50mm
Technical Name: Rhodium
Formula: Rh
Percentage Purity: 99.9%
Density: 12.4g/cm³
CAS Number: 7440-16-6
UOM Code: 870-110-52POAeachDiscounts applied for volume purchases
Filter By
Filter By
My Wish List
Last Added Items
You have no items in your wish list.
