Germanium Sputtering Target
Germanium Sputtering Targets are high-purity germanium discs available in 4 variations for customizable diameter, thickness and orientation options to meet different application needs. Ultra-high purity germanium has excellent semiconducting properties ideal for thin film deposition via sputtering. Common applications include manufacturing microelectronics, optical coatings and advanced solar cells, where precise control over germanium film thickness and composition is critical.
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Germanium Sputtering Target Thickness: 2mm
Diameter: 25.4mm
Technical Name: Germanium
Formula: Ge
Percentage Purity: 99.999%
Density: 5.323g/cm³
CAS Number: 7440-56-4
UOM Code: 556-658-05€194.51 Price from €143.94eachDiscounts applied for volume purchases -
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Germanium Sputtering Target Thickness: 2mm
Diameter: 50mm
Technical Name: Germanium
Formula: Ge
Percentage Purity: 99.999%
Density: 5.323g/cm³
CAS Number: 7440-56-4
UOM Code: 892-569-52€332.39 Price from €245.97eachDiscounts applied for volume purchases -
Germanium Sputtering Target Thickness: 6mm
Diameter: 25.4mm
Technical Name: Germanium
Formula: Ge
Percentage Purity: 99.999%
Density: 5.323g/cm³
CAS Number: 7440-56-4
UOM Code: 908-135-73€295.46 Price from €218.64eachDiscounts applied for volume purchases -
Germanium Sputtering Target Thickness: 6mm
Diameter: 50.8mm
Technical Name: Germanium
Formula: Ge
Percentage Purity: 99.999%
Density: 5.323g/cm³
CAS Number: 7440-56-4
UOM Code: 557-084-09€627.85 Price from €464.61eachDiscounts applied for volume purchases
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