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Grade: Yttria-Stabilized Zirconia (YSZ)
Composition: ZrO₂/Y₂O₃
Form: Sputtering Target
Material: Zirconium Oxide
CAS Number: 114168-16-0
Commodity: Ceramics
Production Method:
Hot Pressed
Yttria Stabilised Zirconia (YSZ) Sputtering Target delivers dense, high-purity ceramic material optimized for thin film deposition via physical vapor deposition (PVD). The stabilized zirconia structure provides ionic conductivity, thermal stability, and resistance to cracking under plasma conditions. Industries including microelectronics, renewable energy, and optics employ YSZ sputtering targets for thin films in fuel cells, optical coatings, and solid-state sensors. Specific applications include deposition of electrolyte layers in solid oxide fuel cells, scratch-resistant optical coatings, and thin film ionic conductors. In research, YSZ sputtering targets are studied for thin film microstructure, ionic transport pathways, and stability under plasma deposition. Their precision, purity, and electrochemical relevance make them indispensable in energy storage, microelectronics, and functional coating technologies.
Material Properties for Ceramics
Thermal Properties
| Element | Value |
|---|---|
| Melting point( C ) | 2700 |
| Upper continuous use temperature( C ) | 2200 |
| Specific heat( J K⁻¹ kg⁻¹ ) | 400-500@25°C |
| Thermal conductivity( W m⁻¹ K⁻¹ ) | 2.5@20°C |
| Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) | 10@20-1000°C |
Physical Properties
| Element | Value |
|---|---|
| Density( gcm⁻³ ) | 5.9 |
Mechanical Properties
| Element | Value |
|---|---|
| Tensile modulus( GPa ) | 200 |
| Hardness - Vickers( kgf mm⁻² ) | 1250 |
| Tensile strength( MPa ) | 300-600 |
Pultrusions
| Element | Value |
|---|---|
| Compressive strength( MPa ) | 2000 |
Other Customers Purchased
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Yttria-stabilized Zirconia Tube YSZ tube: ionically conductive, tough, thermally stable; tubular form for electrochemical and high‑temp systems including SOFC electrolytes, oxygen sensors, and reactor housings; supports transport and permeability studies.each
Starting at $1,890.00
Discounts applied for volume purchases -
Nickel/Vanadium Alloy Sputtering Target (Ni93/V7) Nickel vanadium alloy sputtering target (Ni93/V7) provides corrosion resistance, mechanical strength, and uniform thin‑film deposition for wear‑resistant, magnetic, and diffusion‑barrier coatings.each
Starting at $540.00
Discounts applied for volume purchases -
Yttria-stabilized Zirconia Powder YSZ powder: thermally stable, ionically conductive, chemically resistant; used for thermal barrier coatings, SOFC electrolytes, and biomedical implants; supports composite ceramics, ionic transport studies, and nanostructured systems.each
Starting at $295.00
Discounts applied for volume purchases -
Zinc Oxide/Gallium Oxide Sputtering Target (2% GZO) GZO sputtering target (2% Ga): ZnO with Ga for enhanced conductivity and stability; deposits transparent conductive films for solar modules, LEDs, and displays; studied for mobility, uniformity, and environmental resistance.each
Starting at $870.00
Discounts applied for volume purchases -
Yttria-stabilized Zirconia Granules YSZ granules: tough, stable ceramic particles with high ionic conductivity and thermal resistance; used for powder metallurgy, plasma spraying, thermal barriers, oxygen sensors, and dental ceramics.each
Starting at $176.00
Discounts applied for volume purchases -
Nickel/Iron/Molybdenum Alloy Sputtering Target (Ni80/Fe15.5/Mo4.5) Nickel iron molybdenum alloy sputtering target (Ni80/Fe15.5/Mo4.5) provides stable magnetic properties, low film stress, and uniform thin‑film deposition for magnetic memory, inductors, sensors, and shielding layers.each
Starting at $431.00
Discounts applied for volume purchases
