Vanadium Sputtering Target

Vanadium Sputtering Target provides a high-purity, dense metallic form designed for use in physical vapor deposition (PVD) systems to create thin films with desirable electrical, catalytic, and mechanical properties. With excellent adhesion and uniformity, vanadium films are applied in microelectronics, catalysis, and protective coatings. Industries including semiconductors, aerospace, and energy storage employ vanadium sputtering targets for integrated circuits, catalytic layers, and electrode coatings. Specific applications include thin films for battery electrodes, catalytic films in chemical processing, and corrosion-resistant layers on aerospace components. In research, vanadium sputtering targets are studied for thin film stoichiometry, adhesion properties, and catalytic efficiency. Their combination of controllable deposition, purity, and versatility makes vanadium sputtering targets indispensable in microelectronics, catalysis, and energy innovation.

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Properties

Reference & Citations

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	23
Crystal structure	Body centred cubic
Electronic structure	Ar 3d³ 4s²
Valences shown	2,3,4,5
Atomic weight( amu )	50.9415
Thermal neutron absorption cross-section( Barns )	5.06
Photo-electric work function( eV )	4.3
Natural isotope distribution( Mass No./% )	51/ 99.75
Natural isotope distribution( Mass No./% )	50/ 0.25
Atomic radius - Goldschmidt( nm )	0.136
Ionisation potential( No./eV )	3/ 29.3
Ionisation potential( No./eV )	2/ 14.6
Ionisation potential( No./eV )	5/ 65.2
Ionisation potential( No./eV )	6/ 128
Ionisation potential( No./eV )	1/ 6.74
Ionisation potential( No./eV )	4/ 46.7

Mechanical Properties

Element	Value
Material condition	Hard
Material condition	Soft
Poisson's ratio	0.365
Poisson's ratio	0.365
Bulk modulus( GPa )	158
Bulk modulus( GPa )	158
Tensile modulus( GPa )	127.6
Tensile modulus( GPa )	127.6
Izod toughness( J m⁻¹ )	10-136
Hardness - Vickers( kgf mm⁻² )	80
Hardness - Vickers( kgf mm⁻² )	150
Tensile strength( MPa )	260-585
Tensile strength( MPa )	530-730
Yield strength( MPa )	170-450
Yield strength( MPa )	515-690

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	19.6@20@20°C
Superconductivity critical temperature( K )	5.4
Temperature coefficient( K⁻¹ )	0.0039@0-100°C
Thermal emf against Pt (cold 0C - hot 100C)( mV )	0.63

Physical Properties

Element	Value
Boiling point( C )	3380
Density( gcm⁻³ )	6.1@20°C

Thermal Properties

Element	Value
Melting point( C )	1890
Latent heat of evaporation( J g⁻¹ )	8975
Latent heat of fusion( J g⁻¹ )	345
Specific heat( J K⁻¹ kg⁻¹ )	486@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	30.7@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	8.3@0-100°C