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Thulium Sputtering Target

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Composition: Tm Form: Sputtering Target Material: Thulium CAS Number: 7440-30-4 Commodity: Metals Purity: 99% Thickness: 1mm
Thulium Sputtering Target combines high purity, density uniformity, and distinct magnetic and optical properties in a precisely engineered disk for thin-film deposition. Its composition allows fabrication of coatings for lasers, optical amplifiers, and magneto-optical sensors, with applications in defense, photonics, and electronics. Industries use thulium targets to deposit films for fiber laser components, advanced display phosphors, and functional sensor surfaces. In research, they facilitate the creation of rare-earth-based layers for spintronic devices, solid-state cooling systems, and infrared emission coatings. The target’s precision machining ensures even sputtering rates and controlled film growth, minimizing defects and ensuring reproducible material properties. This combination of structural accuracy, chemical stability, and specialized material performance makes thulium sputtering targets essential for high-specification thin-film production environments.

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Material Properties

Atomic Properties
Element Value
Atomic number 69
Crystal structure Hexagonal close packed
Electronic structure Xe 4f¹³ 6s²
Valences shown 2,3
Atomic weight( amu ) 168.9342
Thermal neutron absorption cross-section( Barns ) 115
Atomic radius - Goldschmidt( nm ) 0.174
Ionisation potential( No./eV ) 1/ 6.18
Ionisation potential( No./eV ) 3/ 23.71
Ionisation potential( No./eV ) 2/ 12.05
Mechanical Properties
Element Value
Hardness - Brinell 53
Material condition Polycrystalline
Poisson's ratio 0.235
Bulk modulus( GPa ) 40.5
Tensile modulus( GPa ) 76
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 90@20°C
Temperature coefficient( K⁻¹ ) 0.00195@0-100°C
Physical Properties
Element Value
Boiling point( C ) 1947
Density( gcm⁻³ ) 9.322@25°C
Thermal Properties
Element Value
Melting point( C ) 1545
Latent heat of evaporation( J g⁻¹ ) 1456
Latent heat of fusion( J g⁻¹ ) 109
Specific heat( J K⁻¹ kg⁻¹ ) 160@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 16.9@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 11.6@0-400°C
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Available Configurations

Properties common to all products in this list

Composition: Tm Form: Sputtering Target Material: Thulium CAS Number: 7440-30-4 Commodity: Metals Purity: 99% Thickness: 1mm

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