Thulium Sputtering Target

Thulium Sputtering Targets are available in 2 variations. They offer the benefits of Thulium, which is a rare earth metal. This soft, malleable and ductile material has high thermal conductivity and moderate electrical conductivity. These target disks are commonly used for thin film deposition and coating applications using sputter deposition techniques. The magnetic and optical properties of thulium make it useful for specialized electronic and optical devices.

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Properties

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Flammable

each

Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	69
Crystal structure	Hexagonal close packed
Electronic structure	Xe 4f¹³ 6s²
Valences shown	2,3
Atomic weight( amu )	168.9342
Thermal neutron absorption cross-section( Barns )	115
Atomic radius - Goldschmidt( nm )	0.174
Ionisation potential( No./eV )	1/ 6.18
Ionisation potential( No./eV )	3/ 23.71
Ionisation potential( No./eV )	2/ 12.05

Mechanical Properties

Element	Value
Hardness - Brinell	53
Material condition	Polycrystalline
Poisson's ratio	0.235
Bulk modulus( GPa )	40.5
Tensile modulus( GPa )	76

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	90@20@20°C
Temperature coefficient( K⁻¹ )	0.00195@0-100°C

Physical Properties

Element	Value
Boiling point( C )	1947
Density( gcm⁻³ )	9.322@25°C

Thermal Properties

Element	Value
Melting point( C )	1545
Latent heat of evaporation( J g⁻¹ )	1456
Latent heat of fusion( J g⁻¹ )	109
Specific heat( J K⁻¹ kg⁻¹ )	160@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	16.9@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	11.6@0-400°C

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Thulium Sputtering Target

Material Properties for Metals