Samarium Sputtering Target

Samarium Sputtering Target delivers high magnetic performance, oxidation resistance, and thermal stability in a dense, uniform form optimized for thin-film deposition. Its composition supports production of magnetic, optical, and functional coatings with consistent properties. Industries such as data storage, sensors, and electronics use samarium sputtering targets to create magnetic layers for hard drives, magneto-optical disks, and high-frequency microwave components. In research, they are employed for tailoring thin-film anisotropy, studying rare-earth-based magnetic behavior, and developing multifunctional coatings. The sputtering target form allows precise control over film thickness and composition, ensuring repeatable, high-quality results in both experimental and commercial coating systems. Its role in enabling advanced surface engineering underscores its importance in high-tech manufacturing.

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Properties

Reference & Citations

Flammable

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	62
Crystal structure	Rhombohedral
Electronic structure	Xe 4f⁶ 6s²
Valences shown	2,3
Atomic weight( amu )	150.36
Thermal neutron absorption cross-section( Barns )	5820
Photo-electric work function( eV )	2.7
Natural isotope distribution( Mass No./% )	149/ 13.9
Natural isotope distribution( Mass No./% )	144/ 3.1
Natural isotope distribution( Mass No./% )	148/ 11.3
Natural isotope distribution( Mass No./% )	152/ 26.6
Natural isotope distribution( Mass No./% )	147/ 15.1
Natural isotope distribution( Mass No./% )	150/ 7.4
Natural isotope distribution( Mass No./% )	154/ 22.6
Atomic radius - Goldschmidt( nm )	0.18
Ionisation potential( No./eV )	1/ 5.63
Ionisation potential( No./eV )	2/ 11.07

Mechanical Properties

Element	Value
Material condition	Polycrystalline
Poisson's ratio	0.31
Bulk modulus( GPa )	29.9
Tensile modulus( GPa )	34.1
Tensile strength( MPa )	124
Yield strength( MPa )	110

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	92@20@20°C
Temperature coefficient( K⁻¹ )	0.00148@0-100°C

Physical Properties

Element	Value
Boiling point( C )	1791
Density( gcm⁻³ )	7.536@20°C

Thermal Properties

Element	Value
Melting point( C )	1077
Latent heat of evaporation( J g⁻¹ )	1280
Latent heat of fusion( J g⁻¹ )	72.4
Specific heat( J K⁻¹ kg⁻¹ )	180@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	13.3@0-100°C