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Formula: MoSi₂
Form: Sputtering Target
Material: Molybdenum Disilicide
CAS Number: 12136-78-6
Commodity: Compounds
Thickness:
6mm
Molybdenum Disilicide Sputtering Targets are monolithic sputtering targets composed of molybdenum disilicide (MoSi2), available in 2 variations. Molybdenum disilicide possesses useful properties like a high melting point, oxidation resistance and electrical conductivity. These sputtering target disks are commonly used for thin film deposition applications like coating machine tools and turbine blades to improve wear and corrosion resistance.
Material Properties for Compounds
Physical Properties
| Element | Value |
|---|---|
| Density( gcm⁻³ ) | 6.31 |
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Molybdenum Disilicide Powder Formula: MoSi₂
Percentage Purity: 99.5%
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Niobium Silicide Powder Formula: NbSi₂
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Tantalum Silicide Powder Formula: TaSi₂
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Titanium Silicide Powder Formula: TiSi₂
Percentage Purity: 99%
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CAS Number: 12039-83-7
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