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Formula: TaSi₂
Form: Powder
Material: Tantalum Silicide
Commodity: Compounds
Purity: 99%
Max Particle Size: 45μm
Tantalum Silicide Powder combines excellent electrical conductivity, high-temperature oxidation resistance, and mechanical stability in a finely divided form optimized for advanced materials fabrication. This powder is used in the production of diffusion barriers, high-performance resistors, and protective coatings for aerospace components. Its ability to withstand extreme thermal cycling without degradation makes it valuable in electronics, semiconductor processing, and turbine technology. Research applications include studying intermetallic phase formation, fabricating cermet composites, and creating high-temperature oxidation-resistant coatings. The powder format’s high surface area promotes efficient reaction kinetics, making tantalum silicide a preferred choice for sintering and powder metallurgy processes where conductivity and stability are paramount.
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Tolerances

Powder
Mean Particle Size Nominal
Minimum Particle Size Nominal
Maximum Particle Size Nominal
Maximum Particle Size Nominal
Particle Size D10 Nominal
Particle Size D50 Nominal
Particle Size D90 Nominal

Material Properties for Compounds

Physical Properties
Element Value
Density( gcm⁻³ ) 9.14

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