Tungsten Silicide Sputtering Target

Tungsten Silicide Sputtering Targets are a high-performance material with a high melting point and excellent conductivity. These properties make tungsten silicide valued for thin film deposition applications like microelectronics fabrication. These precision-engineered targets enable efficient, uniform coatings in semiconductor production and related manufacturing.

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Starting at $710.66 each
Discounts applied for volume purchases