Magnesium Sputtering Target

Magnesium Sputtering Target is a precision-engineered metallic source material optimized for thin-film deposition, offering high purity, uniformity, and reliable sputtering performance. Its low atomic mass, high reactivity, and excellent adherence to substrates make it suitable for producing coatings with controlled thickness and composition. Industries such as microelectronics, photovoltaics, and protective coatings employ magnesium sputtering targets extensively for their ability to deliver lightweight, conductive, and reactive films. Specific technologies benefiting from these targets include thin-film solar cells, where magnesium enhances light absorption and stability; semiconductor devices requiring low-defect Mg-based films with strong adhesion; and protective or catalytic coatings in aerospace and energy storage systems. Research has emphasized improvements in target fabrication to reduce pinhole density and particle generation, refinement of crystal grain size for uniform film deposition, and hybrid Mg–alloy sputtering targets to improve conductivity during DC sputtering. By enabling consistent, defect-free film growth across advanced applications, Magnesium Sputtering Targets remain essential in driving the evolution of thin-film technologies and industrial device manufacturing.

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Properties

Reference & Citations

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	12
Crystal structure	Hexagonal close packed
Electronic structure	Ne 3s²
Valences shown	2
Atomic weight( amu )	24.305
Thermal neutron absorption cross-section( Barns )	0.064
Photo-electric work function( eV )	3.66
Natural isotope distribution( Mass No./% )	24/ 78.99
Natural isotope distribution( Mass No./% )	26/ 11.01
Natural isotope distribution( Mass No./% )	25/ 10.00
Atomic radius - Goldschmidt( nm )	0.16
Ionisation potential( No./eV )	2/ 15.03
Ionisation potential( No./eV )	6/ 187
Ionisation potential( No./eV )	4/ 109
Ionisation potential( No./eV )	5/ 141
Ionisation potential( No./eV )	1/ 7.65
Ionisation potential( No./eV )	3/ 80.1

Mechanical Properties

Element	Value
Material condition	Hard
Material condition	Soft
Poisson's ratio	0.291
Poisson's ratio	0.291
Bulk modulus( GPa )	35.6
Bulk modulus( GPa )	35.6
Tensile modulus( GPa )	44.7
Tensile modulus( GPa )	44.7
Hardness - Vickers( kgf mm⁻² )	35-45
Hardness - Vickers( kgf mm⁻² )	30-35
Tensile strength( MPa )	232
Tensile strength( MPa )	185
Yield strength( MPa )	69
Yield strength( MPa )	100

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	4.2@20@20°C
Temperature coefficient( K⁻¹ )	0.00425@0-100°C
Thermal emf against Pt (cold 0C - hot 100C)( mV )	0.44

Physical Properties

Element	Value
Boiling point( C )	1090
Density( gcm⁻³ )	1.74@20°C

Thermal Properties

Element	Value
Melting point( C )	649
Latent heat of evaporation( J g⁻¹ )	5254
Latent heat of fusion( J g⁻¹ )	362
Specific heat( J K⁻¹ kg⁻¹ )	1020@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	156@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	26@0-100°C