Titanium Thin Film Disk (Mylar® Backing)

Titanium Thin Film Disk is a precisely fabricated form of high-purity titanium foil or sheet cut into circular geometry, designed for use in vacuum deposition, analytical instrumentation, and surface science applications. Its thin profile ensures rapid thermal equilibration, making it ideal for experiments where precise heat control or uniform sputtering is required. Industries such as microelectronics, optics, and surface engineering use titanium thin film disks for creating adhesion layers, reflective coatings, and barrier films. Specific applications include electron microscopy sample supports, base layers in semiconductor device fabrication, and substrates for high-precision optical filters. In research, these disks are valued for enabling controlled deposition studies, surface chemistry investigations, and multilayer thin film development. Their combination of geometry-specific convenience, material purity, and compatibility with high-vacuum systems makes them an essential consumable in advanced material processing and characterization.

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Tolerance

Properties

Reference & Citations

each

Tolerances

Thin Film

Thickness		±30%

Disk

Diameter		±20%

Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	22
Crystal structure	Hexagonal close packed
Electronic structure	Ar 3d² 4s²
Valences shown	2,3,4
Atomic weight( amu )	47.88
Thermal neutron absorption cross-section( Barns )	6.1
Photo-electric work function( eV )	4.1
Natural isotope distribution( Mass No./% )	50/ 5.3
Natural isotope distribution( Mass No./% )	49/ 5.5
Natural isotope distribution( Mass No./% )	46/ 8.0
Natural isotope distribution( Mass No./% )	48/ 73.7
Natural isotope distribution( Mass No./% )	47/ 7.5
Atomic radius - Goldschmidt( nm )	0.147
Ionisation potential( No./eV )	3/ 27.5
Ionisation potential( No./eV )	4/ 43.3
Ionisation potential( No./eV )	5/ 99.2
Ionisation potential( No./eV )	1/ 6.82
Ionisation potential( No./eV )	2/ 13.6
Ionisation potential( No./eV )	6/ 119

Mechanical Properties

Element	Value
Material condition	Polycrystalline
Material condition	Annealed
Poisson's ratio	0.361
Poisson's ratio	0.361
Poisson's ratio	-
Bulk modulus( GPa )	108.4
Bulk modulus( GPa )	-
Bulk modulus( GPa )	108.4
Tensile modulus( GPa )	-
Tensile modulus( GPa )	120.2
Tensile modulus( GPa )	120.2
Izod toughness( J m⁻¹ )	61
Izod toughness( J m⁻¹ )	61
Hardness - Vickers( kgf mm⁻² )	60
Hardness - Vickers( kgf mm⁻² )	60
Tensile strength( MPa )	230-460
Tensile strength( MPa )	230-460
Yield strength( MPa )	140-250
Yield strength( MPa )	140-250

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	54@20@20°C
Superconductivity critical temperature( K )	0.4
Temperature coefficient( K⁻¹ )	0.0038@0-100°C

Physical Properties

Element	Value
Boiling point( C )	3287
Density( gcm⁻³ )	4.5@20°C

Thermal Properties

Element	Value
Melting point( C )	1660
Latent heat of evaporation( J g⁻¹ )	8893
Latent heat of fusion( J g⁻¹ )	365
Specific heat( J K⁻¹ kg⁻¹ )	523@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	21.9@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	8.9@0-100°C