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Tantalum Tube

Available Configurations

Properties common to all products in this list

Composition: Ta Form: Tube Material: Tantalum CAS Number: 7440-25-7 Commodity: Metals Purity: 99.9% (3N)
Wall Thickness Inside Diameter Outside Diameter Length Temper ⓘ
0.06 mm to 2 mm 0.19 mm to 19 mm 0.31 mm to 20 mm 6 mm to 1000 mm As drawn
Annealed

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Tantalum Tube delivers 99.9% purity tantalum in a precision hollow form suitable for applications that demand both dimensional accuracy and aggressive-environment durability. The hollow cross-section makes Tantalum Tube the natural choice for acid-service heat exchangers, where corrosion-resistant tubing transfers heat between aggressive process streams without degradation, and for thermowells and thermocouple sheaths in high-temperature reactors and furnaces. In semiconductor manufacturing, tantalum tubes serve as flow liners in reactive-gas delivery systems and as structural components in plasma etching chamber assemblies. Their biocompatibility and resistance to body fluids support medical implant applications, while their low vapour pressure and vacuum stability make them well suited to discharge and shielding components in high-vacuum systems.
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Key Features

Tantalum Tube delivers 99.9% purity tantalum in a precision hollow form, combining dimensional accuracy, aggressive-environment durability, and vacuum stability for heat transfer, semiconductor, medical, and high-vacuum applications:

Precision Hollow Form for Heat Transfer & Flow Applications

The hollow cross-section makes Tantalum Tube the natural choice for acid-service heat exchangers, where corrosion-resistant tubing transfers heat between aggressive process streams without degradation, and for thermowells and thermocouple sheaths in high-temperature reactors and furnaces where dimensional accuracy and chemical inertness are both required.

Exceptional Corrosion Resistance in Aggressive Media

Tantalum Tube resists attack from virtually all acids and aggressive chemical environments, supporting its use as flow liners in reactive-gas delivery systems and structural components in plasma etching chamber assemblies in semiconductor manufacturing, where standard tube materials would be rapidly degraded by process chemistry.

High-Temperature Stability (Melting Point 3,017 °C)

With a melting point of 3,017 °C, Tantalum Tube maintains its dimensional integrity and corrosion resistance as thermowells and thermocouple sheaths in high-temperature reactors and furnaces, where combined thermal and chemical exposure would compromise tubes made from less refractory materials.

Low Vapour Pressure & Vacuum Stability

Tantalum Tube's low vapour pressure and vacuum stability make it well suited to discharge and shielding components in high-vacuum systems, where outgassing or vapour evolution from tube materials would contaminate the vacuum environment or degrade system performance.

Biocompatibility for Medical Implant Applications

Tantalum Tube's biocompatibility and resistance to body fluids support medical implant applications where a hollow cylindrical geometry, chemical inertness in physiological environments, and long-term compatibility with biological tissue are all required in the implanted component.

Industrial Applications

Tantalum Tube is used across chemical processing, semiconductor, medical, and high-vacuum sectors where a precision hollow form combining corrosion resistance, thermal stability, and vacuum compatibility is required:

Acid-Service Heat Exchangers
Used as corrosion-resistant tubing in acid-service heat exchangers, where Tantalum Tube transfers heat between aggressive process streams without degradation — providing reliable long-term performance in the highly corrosive environments encountered in chemical and pharmaceutical processing where standard metallic tubing would fail.
Thermowells & Thermocouple Sheaths
Employed as thermowells and thermocouple sheaths in high-temperature reactors and furnaces, where the combination of a melting point of 3,017 °C, dimensional accuracy, and resistance to aggressive process chemistry ensures reliable temperature measurement in the most demanding thermal and chemical service conditions.
Semiconductor Reactive-Gas Delivery & Plasma Etching
Used as flow liners in reactive-gas delivery systems and as structural components in plasma etching chamber assemblies, where Tantalum Tube's resistance to the halogen-based and highly oxidising process chemistries encountered in semiconductor manufacturing protects system integrity and prevents contamination of process streams.
High-Vacuum Discharge & Shielding Components
Applied as discharge and shielding components in high-vacuum systems, where low vapour pressure and vacuum stability ensure that tube components do not contribute to outgassing or vapour evolution that would contaminate the vacuum environment or degrade the performance of sensitive vacuum-based processes and instruments.
Medical Implant Applications
Used in medical implant applications where a hollow cylindrical geometry, biocompatibility, and resistance to body fluids are all required — supporting implant designs where the tube form provides structural function, fluid passage, or both within a physiological environment over extended service life.

Synonyms

Tantalum hollow cylinder Tantalum tubing Tantalum pipe Tantalum piping

Material Properties

Atomic Properties
Element Value
Atomic number 73
Crystal structure Body centred cubic
Electronic structure Xe 4f¹⁴ 5d³ 6s²
Valences shown 2,3,4,5
Atomic weight( amu ) 180.9479
Thermal neutron absorption cross-section( Barns ) 22
Photo-electric work function( eV ) 4.1
Natural isotope distribution( Mass No./% ) 180/ 0.012
Natural isotope distribution( Mass No./% ) 181/ 99.988
Atomic radius - Goldschmidt( nm ) 0.147
Ionisation potential( No./eV ) 1/ 7.88
Ionisation potential( No./eV ) 2/ 16.2
Mechanical Properties
Element Value
Material condition Hard
Material condition Soft
Poisson's ratio 0.342
Poisson's ratio 0.342
Bulk modulus( GPa ) 196.3
Bulk modulus( GPa ) 196.3
Tensile modulus( GPa ) 185.7
Tensile modulus( GPa ) 185.7
Hardness - Vickers( kgf mm⁻² ) 200
Hardness - Vickers( kgf mm⁻² ) 90
Tensile strength( MPa ) 760
Tensile strength( MPa ) 172-207
Yield strength( MPa ) 705
Yield strength( MPa ) 310-380
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 13.5@20°C
Superconductivity critical temperature( K ) 4.47
Temperature coefficient( K⁻¹ ) 0.0035@0-100°C
Thermal emf against Pt (cold 0C - hot 100C)( mV ) 0.33
Physical Properties
Element Value
Boiling point( C ) 5425
Density( gcm⁻³ ) 16.6@20°C
Thermal Properties
Element Value
Melting point( °C ) 3017
Latent heat of evaporation( J g⁻¹ ) 4165
Latent heat of fusion( J g⁻¹ ) 174
Specific heat( J K⁻¹ kg⁻¹ ) 140@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 57.5@0-100
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 6.5@0-100°C
each

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Available Configurations

Properties common to all products in this list

Composition: Ta Form: Tube Material: Tantalum CAS Number: 7440-25-7 Commodity: Metals Purity: 99.9% (3N)

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Tolerances

Tube
Outside Diameter =<2mm ±0.05mm
Outside Diameter 2mm - 5mm ±0.1mm
Outside Diameter >5mm ±5%
Wall Thickness ±10%
Length <100mm ±1mm
Length >=100mm +5% / -1%