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Praseodymium Sputtering Target

Praseodymium Sputtering Targets comes in 4 variations. They’re used to deposit uniform thin film coatings onto substrates via the sputtering process. They’re used in optical coating applications and in the manufacture of electrical components. The high purity praseodymium deposition layer these disks provide enables precise control over the optical, electrical and magnetic properties of the sputtered film.
Formula: Pr
Percentage Purity: 99%
Thickness: 3mm
Diameter: 75mm
CAS Number: 7440-10-0
UOM Code: 709-720-27
SKU: 1000199444
Product Code: PR00-ST-000200

Flammable

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Material Properties for Metals

Atomic Properties
Element Value
Atomic number 59
Crystal structure Hexagonal close packed
Electronic structure Xe 4f³ 6s²
Valences shown 3,4
Atomic weight( amu ) 140.9077
Thermal neutron absorption cross-section( Barns ) 11.5
Atomic radius - Goldschmidt( nm ) 0.183
Ionisation potential( No./eV ) 1/ 5.42
Ionisation potential( No./eV ) 2/ 10.55
Ionisation potential( No./eV ) 4/ 38.95
Ionisation potential( No./eV ) 5/ 57.45
Ionisation potential( No./eV ) 3/ 21.62
Mechanical Properties
Element Value
Material condition Polycrystalline
Poisson's ratio 0.312
Bulk modulus( GPa ) 31.2
Tensile modulus( GPa ) 35.2
Hardness - Vickers( kgf mm⁻² ) 40
Tensile strength( MPa ) 110
Yield strength( MPa ) 103
Electrical Properties
Element Value
Electrical resistivity( µOhmcm ) 68@20@20°C
Temperature coefficient( K⁻¹ ) 0.00171@0-100°C
Physical Properties
Element Value
Boiling point( C ) 3512
Density( gcm⁻³ ) 6.782@20°C
Thermal Properties
Element Value
Melting point( C ) 931
Latent heat of evaporation( J g⁻¹ ) 2343
Latent heat of fusion( J g⁻¹ ) 80
Specific heat( J K⁻¹ kg⁻¹ ) 192@25°C
Thermal conductivity( W m⁻¹ K⁻¹ ) 12.5@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 4.8@0-100
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