Palladium Sputtering Target

Palladium Sputtering Target provides high purity, uniform density, and excellent adhesion characteristics, making it ideal for thin-film deposition. Its properties enable high-performance coatings for electronics, optics, and catalytic layers. Industries such as microelectronics, renewable energy, and catalysis employ it to produce conductive films, hydrogen-permeable membranes, and sensor surfaces. Specific uses include deposition of catalytic layers for fuel cells, manufacturing of hydrogen sensors, and coating of optical components for enhanced performance. In research, it supports development of advanced thin-film technologies, surface functionalization, and nanoengineered catalytic systems. The combination of film quality, catalytic activity, and structural uniformity makes palladium sputtering targets crucial in precision manufacturing and applied research.

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Properties

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Material Properties for Precious Metals

Atomic Properties

Element	Value
Atomic number	46
Crystal structure	Face centred cubic
Electronic structure	Kr 4d¹⁰
Valences shown	2, 3, 4
Atomic weight( amu )	106.42
Thermal neutron absorption cross-section( Barns )	6
Photo-electric work function( eV )	5
Natural isotope distribution( Mass No./% )	108/ 26.7
Natural isotope distribution( Mass No./% )	110/ 11.8
Natural isotope distribution( Mass No./% )	104/ 11.0
Natural isotope distribution( Mass No./% )	102/ 1.0
Natural isotope distribution( Mass No./% )	105/ 22.2
Natural isotope distribution( Mass No./% )	106/ 27.3
Atomic radius - Goldschmidt( nm )	0.137
Ionisation potential( No./eV )	1/ 8.3
Ionisation potential( No./eV )	2/ 19.4
Ionisation potential( No./eV )	3/ 32.9

Mechanical Properties

Element	Value
Material condition	Soft
Material condition	Hard
Poisson's ratio	0.39
Poisson's ratio	0.39
Bulk modulus( GPa )	187
Bulk modulus( GPa )	187
Tensile modulus( GPa )	121
Tensile modulus( GPa )	121
Hardness - Vickers( kgf mm⁻² )	40
Hardness - Vickers( kgf mm⁻² )	100
Tensile strength( MPa )	140-195
Tensile strength( MPa )	325
Yield strength( MPa )	205
Yield strength( MPa )	34.5

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	10.8@20@20
Temperature coefficient( K⁻¹ )	0.0042@0-100
Thermal emf against Pt (cold 0C - hot 100C)( mV )	-0.57

Physical Properties

Element	Value
Boiling point( C )	3140
Density( gcm⁻³ )	12@20°C

Thermal Properties

Element	Value
Melting point( C )	1554
Latent heat of evaporation( J g⁻¹ )	3398
Latent heat of fusion( J g⁻¹ )	157
Specific heat( J K⁻¹ kg⁻¹ )	244@25
Thermal conductivity( W m⁻¹ K⁻¹ )	71.8@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	11@0-100