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Formula: SiO₂
Form: Sputtering Target
Material: Quartz - Fused
CAS Number: 14808-60-7
Commodity: Ceramics
Our range of Quartz - Fused Sputtering Targets are manufactured from high purity fused quartz and are available in a variety of dimensions and thicknesses. They have excellent chemical and physical stability at high temperatures making them ideal for sputtering applications where high purity and uniformity is required. They’re commonly used in microelectronics and semiconductor device fabrication to deposit thin and uniform quartz layers onto silicon wafers and other substrates. With 10 variations to choose from, we can provide fused quartz sputtering target disks tailored to your specific sputtering needs.
Material Properties for Ceramics
Chemical Resistance
| Element | Value |
|---|---|
| Acids - concentrated | Good |
| Acids - dilute | Good |
| Alkalis | Fair |
| Halogens | Good |
| Metals | Fair |
Electrical Properties
| Element | Value |
|---|---|
| Dielectric constant | 3.8 |
| Dielectric strength( kV mm⁻¹ ) | 25-40 |
| Volume resistivity( Ohmcm ) | 10¹⁸@25 |
Physical Properties
| Element | Value |
|---|---|
| Refractive index | 1.46 |
| Useful optical transmission range | 180-2500nm |
| Apparent porosity( % ) | 0 |
| Water absorption - saturation( % ) | 0 |
| Density( gcm⁻³ ) | 2.2 |
Thermal Properties
| Element | Value |
|---|---|
| Melting point( C ) | 1715 |
| Upper continuous use temperature( C ) | 1100-1400 |
| Specific heat( J K⁻¹ kg⁻¹ ) | 670-740@25°C |
| Thermal conductivity( W m⁻¹ K⁻¹ ) | 1.46@20°C |
| Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) | 0.54@20-1000 |
Mechanical Properties
| Element | Value |
|---|---|
| Tensile modulus( GPa ) | 72-74 |
| Hardness - Knoop( kgf mm⁻² ) | 820 |
| Hardness - Vickers( kgf mm⁻² ) | 1000 |
| Shear strength( MPa ) | 70 |
| Tensile strength( MPa ) | 48 |
Pultrusions
| Element | Value |
|---|---|
| Compressive strength( MPa ) | 1100 |