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Formula: ZrN
Form: Sputtering Target
Material: Zirconium Nitride
CAS Number: 25658-42-8
Commodity: Compounds
Thickness:
3mm
Diameter:
50.8mm
Hazard Pictogram:
GHS03
Zirconium Nitride Sputtering Targets are made from high-purity zirconium nitride. With excellent hardness, electrical conductivity and thermal stability, they enable the deposition of thin zirconium nitride films via sputtering. Zirconium nitride films are used as wear-resistant coatings, diffusion barriers in microelectronics, and decorative coatings. We offer Zirconium Nitride Sputtering Targets in a variety of sizes and thicknesses to suit different deposition processes and equipment.
Oxidising
Material Properties for Compounds
Thermal Properties
| Element | Value |
|---|---|
| Melting point( C ) | 2980-50 |
Physical Properties
| Element | Value |
|---|---|
| Density( gcm⁻³ ) | 7.09 |
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Titanium Nitride Powder Formula: TiN
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Niobium Nitride Powder Formula: NbN
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Silicon Nitride Powder Formula: Si₃N₄
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Vanadium Nitride Powder Formula: VN
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