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Formula: ZrN
Form: Sputtering Target
Material: Zirconium Nitride
CAS Number: 25658-42-8
Commodity: Compounds
Thickness: 3mm
Diameter: 50.8mm
Hazard Pictogram: GHS03

Zirconium Nitride Sputtering Target

Zirconium Nitride Sputtering Targets are made from high-purity zirconium nitride. With excellent hardness, electrical conductivity and thermal stability, they enable the deposition of thin zirconium nitride films via sputtering. Zirconium nitride films are used as wear-resistant coatings, diffusion barriers in microelectronics, and decorative coatings. We offer Zirconium Nitride Sputtering Targets in a variety of sizes and thicknesses to suit different deposition processes and equipment.

Oxidising

each

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Material Properties for Compounds

Thermal Properties
Element Value
Melting point( C ) 2980-50
Physical Properties
Element Value
Density( gcm⁻³ ) 7.09

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