Zirconium Nitride Sputtering Target

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Zirconium Nitride Sputtering Targets are made from high-purity zirconium nitride. With excellent hardness, electrical conductivity and thermal stability, they enable the deposition of thin zirconium nitride films via sputtering. Zirconium nitride films are used as wear-resistant coatings, diffusion barriers in microelectronics, and decorative coatings. We offer Zirconium Nitride Sputtering Targets in a variety of sizes and thicknesses to suit different deposition processes and equipment.

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