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Zirconium Nitride Sputtering Target

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Composition: ZrN Form: Sputtering Target Material: Zirconium Nitride CAS Number: 25658-42-8 Commodity: Compounds Thickness: 3mm Diameter: 50.8mm
Zirconium Nitride Sputtering Target is a ceramic-metallic target valued for producing thin films with exceptional hardness, wear resistance, and golden metallic luster. Its dense structure ensures uniform deposition in coatings that combine decorative appeal with functional durability. Industries including cutting tools, decorative coatings, and microelectronics use zirconium nitride sputtering targets for advanced protective films. Specific applications include wear-resistant coatings for drills and cutting inserts, optical coatings in decorative applications, and diffusion barriers in semiconductor devices. In research, zirconium nitride sputtering targets are studied for electronic band structure, oxidation resistance, and tribological behavior. The ability to deposit coatings that are both visually appealing and mechanically robust ensures zirconium nitride remains central in coating technology, microelectronics, and materials innovation.

Oxidising

Starting at $910.00 each
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Material Properties

Thermal Properties
Element Value
Melting point( C ) 2980-50
Physical Properties
Element Value
Density( gcm⁻³ ) 7.09
each

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Available Configurations

Properties common to all products in this list

Composition: ZrN Form: Sputtering Target Material: Zirconium Nitride CAS Number: 25658-42-8 Commodity: Compounds Thickness: 3mm Diameter: 50.8mm

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