Titanium Sputtering Target

Titanium Sputtering Target is a high-purity titanium source for physical vapor deposition (PVD) processes, enabling precise and uniform thin-film formation. The dense, homogeneous target ensures consistent sputtering performance, producing coatings with excellent adhesion, controlled thickness, and desired microstructure. Industries including microelectronics, optics, and biomedical engineering rely on titanium sputtering targets for creating conductive adhesion layers, biocompatible coatings, and corrosion-resistant optical films. Specific applications include forming titanium seed layers in semiconductor manufacturing, depositing anti-reflective coatings on optical lenses, and producing bioactive surfaces on medical implants. In research, these targets are essential for exploring film growth kinetics, interface properties, and multilayer coating architectures. Titanium sputtering targets combine chemical stability, ease of deposition, and broad applicability, making them indispensable in advanced thin-film technologies.

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Properties

Reference & Citations

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Material Properties for Metals

Atomic Properties

Element	Value
Atomic number	22
Crystal structure	Hexagonal close packed
Electronic structure	Ar 3d² 4s²
Valences shown	2,3,4
Atomic weight( amu )	47.88
Thermal neutron absorption cross-section( Barns )	6.1
Photo-electric work function( eV )	4.1
Natural isotope distribution( Mass No./% )	50/ 5.3
Natural isotope distribution( Mass No./% )	49/ 5.5
Natural isotope distribution( Mass No./% )	46/ 8.0
Natural isotope distribution( Mass No./% )	48/ 73.7
Natural isotope distribution( Mass No./% )	47/ 7.5
Atomic radius - Goldschmidt( nm )	0.147
Ionisation potential( No./eV )	3/ 27.5
Ionisation potential( No./eV )	4/ 43.3
Ionisation potential( No./eV )	5/ 99.2
Ionisation potential( No./eV )	1/ 6.82
Ionisation potential( No./eV )	2/ 13.6
Ionisation potential( No./eV )	6/ 119

Mechanical Properties

Element	Value
Material condition	Polycrystalline
Material condition	Annealed
Poisson's ratio	0.361
Poisson's ratio	0.361
Poisson's ratio	-
Bulk modulus( GPa )	108.4
Bulk modulus( GPa )	-
Bulk modulus( GPa )	108.4
Tensile modulus( GPa )	-
Tensile modulus( GPa )	120.2
Tensile modulus( GPa )	120.2
Izod toughness( J m⁻¹ )	61
Izod toughness( J m⁻¹ )	61
Hardness - Vickers( kgf mm⁻² )	60
Hardness - Vickers( kgf mm⁻² )	60
Tensile strength( MPa )	230-460
Tensile strength( MPa )	230-460
Yield strength( MPa )	140-250
Yield strength( MPa )	140-250

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	54@20@20°C
Superconductivity critical temperature( K )	0.4
Temperature coefficient( K⁻¹ )	0.0038@0-100°C

Physical Properties

Element	Value
Boiling point( C )	3287
Density( gcm⁻³ )	4.5@20°C

Thermal Properties

Element	Value
Melting point( C )	1660
Latent heat of evaporation( J g⁻¹ )	8893
Latent heat of fusion( J g⁻¹ )	365
Specific heat( J K⁻¹ kg⁻¹ )	523@25°C
Thermal conductivity( W m⁻¹ K⁻¹ )	21.9@0-100°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	8.9@0-100°C