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Formula: TiO₂ 99.6
Form: Sputtering Target
Material: Titanium Dioxide
CAS Number: 13463-67-7
Commodity: Compounds
Titanium Dioxide Sputtering Targets are thin circular disks of high purity titanium dioxide that we produce for use in sputter deposition systems. With 5 variations available, they enable precise control over film thickness and deposition rate for thin film fabrication. Titanium dioxide offers a high refractive index, photoactivity and chemical inertness. Example applications include optical coatings, photocatalysts and protective transparent films. Sputtered titanium dioxide films are used across optics, energy and biomedical sectors.
Material Properties for Compounds
Chemical Resistance
| Element | Value |
|---|---|
| Acids - concentrated | Fair |
| Acids - dilute | Good |
| Alkalis | Poor |
| Metals | Poor |
Electrical Properties
| Element | Value |
|---|---|
| Dielectric constant | 80-100 |
| Volume resistivity( Ohmcm ) | 10¹³-10¹⁸@25 |
Physical Properties
| Element | Value |
|---|---|
| Apparent porosity( % ) | 0 |
| Density( gcm⁻³ ) | 4.05 |
Thermal Properties
| Element | Value |
|---|---|
| Melting point( C ) | 1850 |
| Thermal conductivity( W m⁻¹ K⁻¹ ) | 2.5-5@20°C |
| Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) | 8-10@20-1000°C |
Mechanical Properties
| Element | Value |
|---|---|
| Tensile modulus( GPa ) | 250-300 |
| Hardness - Vickers( kgf mm⁻² ) | 980 |
| Tensile strength( MPa ) | 350 |
Pultrusions
| Element | Value |
|---|---|
| Compressive strength( MPa ) | 800-1000 |
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