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Titanium Dioxide Sputtering Target

Formula: TiO₂ 99.6
Form: Sputtering Target
Material: Titanium Dioxide
CAS Number: 13463-67-7
Commodity: Compounds
Titanium Dioxide Sputtering Targets are thin circular disks of high purity titanium dioxide that we produce for use in sputter deposition systems. With 5 variations available, they enable precise control over film thickness and deposition rate for thin film fabrication. Titanium dioxide offers a high refractive index, photoactivity and chemical inertness. Example applications include optical coatings, photocatalysts and protective transparent films. Sputtered titanium dioxide films are used across optics, energy and biomedical sectors.
Technical Data Sheet Safety Data Sheet Tolerance Properties
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Material Properties for Compounds

Chemical Resistance
Element Value
Acids - concentrated Fair
Acids - dilute Good
Alkalis Poor
Metals Poor
Electrical Properties
Element Value
Dielectric constant 80-100
Volume resistivity( Ohmcm ) 10¹³-10¹⁸@25
Physical Properties
Element Value
Apparent porosity( % ) 0
Density( gcm⁻³ ) 4.05
Thermal Properties
Element Value
Melting point( C ) 1850
Thermal conductivity( W m⁻¹ K⁻¹ ) 2.5-5@20°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 8-10@20-1000°C
Mechanical Properties
Element Value
Tensile modulus( GPa ) 250-300
Hardness - Vickers( kgf mm⁻² ) 980
Tensile strength( MPa ) 350
Pultrusions
Element Value
Compressive strength( MPa ) 800-1000

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