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Composition: TiO₂ 99.6
Form: Sputtering Target
Material: Titanium Dioxide
CAS Number: 13463-67-7
Commodity: Compounds

Titanium Dioxide Sputtering Target

Titanium Dioxide Sputtering Target offers high refractive index, chemical stability, and tailored electrical conductivity when doped, enabling efficient deposition of functional oxide films. With precise doping agents such as indium or zinc oxide, TiO₂ targets achieve low resistivity, supporting DC sputtering without compromising optical or mechanical properties. Industries including optics, semiconductors, and photovoltaics use these targets for producing antireflective coatings, transparent conductive layers, and photocatalytic films. Specific applications include UV-blocking optical windows, conductive underlayers in solar cells, and functional coatings in environmental sensors. In research, TiO₂ sputtering targets facilitate studies on thin-film crystallography, photocatalytic efficiency, and bandgap engineering for optoelectronic devices. Their ability to combine durability, optical performance, and controlled conductivity ensures a critical role in advanced coating technologies.
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Material Properties for Compounds

Chemical Resistance
Element Value
Acids - concentrated Fair
Acids - dilute Good
Alkalis Poor
Metals Poor
Electrical Properties
Element Value
Dielectric constant 80-100
Volume resistivity( Ohmcm ) 10¹³-10¹⁸@25
Physical Properties
Element Value
Apparent porosity( % ) 0
Density( gcm⁻³ ) 4.05
Thermal Properties
Element Value
Melting point( C ) 1850
Thermal conductivity( W m⁻¹ K⁻¹ ) 2.5-5@20°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) 8-10@20-1000°C
Mechanical Properties
Element Value
Tensile modulus( GPa ) 250-300
Hardness - Vickers( kgf mm⁻² ) 980
Tensile strength( MPa ) 350
Pultrusions
Element Value
Compressive strength( MPa ) 800-1000

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