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Titanium Boride Sputtering Target

Formula: TiB₂
Form: Sputtering Target
Material: Titanium Boride
CAS Number: 12045-63-5
Commodity: Compounds
Diameter: 50mm
We offer Titanium Boride Sputtering Targets in 2 variations to meet different processes and equipment. Titanium boride is an extremely hard ceramic material composed of titanium and boron. It has a high melting point, excellent thermal conductivity and good corrosion resistance. These disks are commonly used for thin film deposition and coating applications where high hardness, wear resistance or thermal stability are required, such as hard protective coatings for cutting tools and electronic components. Our choice of Titanium Boride disks provide high purity and uniformity for outstanding performance across different sputter deposition processes
Technical Data Sheet Safety Data Sheet Tolerance Properties
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Material Properties for Compounds

Physical Properties
Element Value
Density( gcm⁻³ ) 4.5

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