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Formula: Ta 97.5/W 2.5
Form: Disk
Material: Tantalum/Tungsten
Commodity: Alloys
Temper:
As Rolled
Thickness:
0.1mm
Tantalum Tungsten Alloy Disk (Ta97.5/W2.5) combines the corrosion resistance and biocompatibility of tantalum with the enhanced strength and high-temperature stability imparted by tungsten, formed into a precisely machined circular geometry. This disk configuration is ideal for use as targets in material deposition, precision contact elements, and high-performance electrodes in corrosive or thermal extremes. Applications span semiconductor manufacturing, chemical process instrumentation, and aerospace electronics. Specific uses include sputtering targets for thin-film coatings, electrode plates for electrochemical cells, and thermal interface components in microelectronics. In research, this alloy disk supports advanced coating development, tribological wear testing, and high-temperature reaction studies. Its combination of tailored alloy performance and dimensional precision ensures dependable operation in environments demanding both chemical inertness and mechanical integrity.
Tolerances
Disc
| Thickness | >0.05mm | ±10% |
|---|---|---|
| Thickness | <0.01mm | ±25% |
| Thickness | 0.01mm - 0.05mm | ±15% |
Material Properties for Alloys
Mechanical Properties
| Element | Value |
|---|---|
| Elongation at break( % ) | <20 |
| Modulus of elasticity( GPa ) | 186 |
| Hardness - Vickers( kgf mm⁻² ) | 115-160 |
| Tensile strength( MPa ) | 240-310 |
Thermal Properties
| Element | Value |
|---|---|
| Melting point( C ) | 3014 |
| Specific heat( J K⁻¹ kg⁻¹ ) | 141@23°C |
| Thermal conductivity( W m⁻¹ K⁻¹ ) | 55@23°C |
| Coefficient of thermal expansion( x10⁻⁶ K⁻¹ ) | 6.48@20-500°C |
Physical Properties
| Element | Value |
|---|---|
| Density( gcm⁻³ ) | 16.66 |
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