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Tantalum Pentoxide Sputtering Target

Formula: Ta₂O₅
Form: Sputtering Target
Material: Tantalum Pentoxide
CAS Number: 1314-61-0
Commodity: Compounds
Thickness: 3mm
Tantalum Pentoxide Sputtering Targets offer a high dielectric constant and refractive index. Properties that make them highly prized for optical coatings and insulating films in microelectronics. We offer these disks in a choice of 2 size variations to accommodate different deposition systems. Their high-purity allows for precise control over film thickness and composition, making Tantalum Pentoxide Sputtering Targets ideal for cutting-edge applications like next-generation computer chips and anti-reflective coatings.
Safety Data Sheet Tolerance Properties
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