T2 Thermocouple Alloy Sputtering Target (Ni95/(Al+Mn+Si)5)

T2 Thermocouple Alloy Sputtering Target (Ni95/Al/Mn/Si 5) delivers precise thermoelectric properties and oxidation resistance in a form optimized for thin-film deposition. Its uniform microstructure ensures consistent coating performance, enabling the production of thin thermoelectric layers, protective films, and functional metallizations for high-temperature environments. Industries apply it in microfabricated thermocouples, oxidation-resistant coatings for aerospace components, and thin-film heaters for precision instrumentation. Specific applications include producing sensor-grade thermoelectric films, coating turbine blade surfaces for oxidation protection, and fabricating integrated microheaters in MEMS devices. In research, it supports development of advanced thermoelectric materials, thin-film oxidation behavior studies, and surface engineering for high-temperature electronics. The sputtering target’s purity and compositional stability ensure reproducible results for cutting-edge thin-film applications.

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Properties

Reference & Citations

Health hazard/Hazardous to the ozone layer

Serious health hazard

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Material Properties for Alloys

Magnetic Properties

Element	Value
Maximum permeability	1.07

Mechanical Properties

Element	Value
Elongation at break( % )	<44
Modulus of elasticity( GPa )	220
Izod impact strength( J m⁻¹ )	108
Tensile strength( MPa )	550-780

Electrical Properties

Element	Value
Electrical resistivity( µOhmcm )	29-33
Temperature coefficient( K⁻¹ )	0.0019

Thermal Properties

Element	Value
Maximum use temperature in air( C )	1100
Melting point( C )	1315-1390
Specific heat( J K⁻¹ kg⁻¹ )	446@23°C
Thermal conductivity( W m⁻¹ K⁻¹ )	30-32@23°C
Coefficient of thermal expansion( x10⁻⁶ K⁻¹ )	16.8@20-1000°C